Patterning of solid state features by direct write nanolithographic printing
The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region chemically bonded to a substrate, wherein the nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.
1. A method of fabricating inorganic/organic nanostructures comprising depositing an ink on a substrate by direct write nanolithography with a tip to form a deposit, wherein the ink comprises an inorganic precursor and at least one organic polymer.
2. The method according to claim 1 , wherein the ink is a sol.
3. The method according to claim 1 , wherein the inorganic precursor is a metal oxide precursor.
4. The method according to claim 1 , wherein the organic polymer is an amphiphilic polymer.
5. The method according to claim 1 , wherein the deposit is heated.
6. The method according to claim 1 , wherein the deposit has at least one lateral dimension of about 1,000 nm or less.
7. The method according to claim 1 , wherein the deposit has at least one lateral dimension of about 200 nm or less.
8. The method according to claim 1 , wherein the depositing forms a pattern of dots.
9. The method according to claim 1 , wherein the depositing forms a pattern of lines.
10. The method according to claim 1 , wherein the depositing is carried out with use of a scanning probe microscopic tip.
11. The method according to claim 10 , wherein the tip is an atomic microforce tip.
12. The method according to claim 11 , wherein the deposit has at least one lateral dimension of about 1,000 nm or less.
13. The method according to claim 11 , wherein the deposit has at least one lateral dimension of about 200 nm or less.
14. The method according to claim 13 , wherein the ink is a sol and the polymer is an amphiphilic polymer.
15. The method according to claim 14 , wherein the inorganic precursor is a metal oxide precursor.
16. A method of fabricating inorganic/organic structures comprising depositing an ink on a substrate by direct write lithography to form a deposit, wherein the depositing is carried out with a tip to transfer ink from the tip to the substrate, and wherein the ink comprises an inorganic precursor and at least one organic polymer.
17. The method according to claim 16 , wherein the depositing is carried out with a nanoscopic tip.
18. The method according to claim 16 , wherein the depositing is carried out with a scanning probe microscopic tip.
19. The method according to claim 16 , wherein the depositing is carried out with an atomic microforce tip.
20. The method according to claim 16 , wherein the deposit has at least one lateral dimension of about 1,000 nm or less.
21. The method according to claim 16 , wherein the deposit has at least one lateral dimension of about 200 nm or less.
22. A method of fabricating inorganic/organic nanostructures comprising depositing an ink on a substrate by direct write nanolithography to form a deposit, wherein the depositing is carried out with a tip to transfer ink from the tip to the substrate, and wherein the ink comprises a sol-gel precursor and at least one organic surfactant.
23. The method of claim 22 , wherein the tip is a nanoscopic tip, and the surfactant is a polymer surfactant.