IP Library › Granted Patent US 7,850,657
Granted Patent B2
US 7,850,657 · App. 12/651,485 · Granted Dec 14, 2010

Microneedle structure and production method therefor

Assignee: Nanopass Technologies Ltd.
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Quick Facts
Patent No.
US 7,850,657
App. No.
12/651,485
Granted
Dec 14, 2010
Kind
B2
Abstract

A method for processing a wafer to form a plurality of hollow microneedles projecting from a substrate includes forming, by use of a dry etching process, a number of groups of recessed features, each including at least one slot deployed to form an open shape having an included area and at least one hole located within the included area. The internal surfaces of the holes and the slots are then coated with a protective layer. An anisotropic wet etching process is then performed in such a manner as to remove material from outside the included areas while leaving a projecting feature within each of the included areas. The protective layer is then removed to reveal the microneedles.

Claims (30)

1. A microneedle structure comprising:

(a) a substrate formed from a single crystal; and

(b) a microneedle projecting from the substrate, said microneedle comprising:

(i) at least two upright surfaces standing substantially perpendicular to the substrate, said two upright surfaces intersecting along an edge, and

(ii) an inclined surface inclined so as to intersect with said at least two upright surfaces,

such that said at least two upright surfaces and said inclined surface enclose a microneedle volume of said single crystal contiguous with said substrate, and wherein a cross-section taken through said microneedle parallel to, and adjacent to, said substrate has a line of symmetry intersecting said edge.

2. The microneedle structure of claim 1 , wherein said inclined surface extends to intersect with the substrate.

3. The microneedle structure of claim 1 , wherein said two upright surfaces are substantially planar surfaces.

4. The microneedle structure of claim 3 , wherein said two upright surfaces subtend an angle of between about 30° and about 120° therebetween.

5. The microneedle structure of claim 1 , wherein said inclined surface corresponds substantially to a <111> crystallographic plane in said single crystal.

6. The microneedle structure of claim 1 , wherein said microneedle further includes a fluid flow channel extending from said inclined surface through said microneedle volume to an opposing face of the substrate.

7. The microneedle structure of claim 6 , wherein said fluid flow channel has an asymmetric cross-sectional shape.

8. The microneedle structure of claim 6 , wherein said fluid flow channel has an elongated rounded cross-sectional shape.

9. The microneedle structure of claim 6 , wherein said fluid flow channel has a substantially elliptical cross-sectional shape.

10. The microneedle structure of claim 6 , wherein said fluid flow channel has a substantially triangular cross-sectional shape.

11. A microneedle structure comprising:

(a) a substrate formed from a single crystal; and

(b) a microneedle projecting from the substrate, said microneedle comprising:

(i) a set of contiguous upright surfaces standing substantially perpendicular to the substrate, said set of contiguous upright surfaces including a first substantially planar surface and a second substantially planar surface, said first and second substantially planar surfaces being non parallel, and

(ii) an inclined surface inclined so as to intersect with said set of contiguous upright surfaces,

such that said set of contiguous upright surfaces and said inclined surface enclose a microneedle volume of said single crystal contiguous with said substrate.

12. The microneedle structure of claim 11 , wherein said first and second substantially planar surfaces intersect at an edge.

13. The microneedle structure of claim 12 , wherein a cross-section taken through said microneedle parallel to, and adjacent to, said substrate has a line of symmetry intersecting said edge.

14. The microneedle structure of claim 11 , wherein said first and second substantially planar surfaces subtend an angle of between about 30° and about 120° therebetween.

15. The microneedle structure of claim 11 , wherein said inclined surface extends to intersect with the substrate.

16. The microneedle structure of claim 11 , wherein said microneedle further includes a fluid flow channel extending from said inclined surface through said microneedle volume to an opposing face of the substrate.

17. The microneedle structure of claim 16 , wherein said fluid flow channel has an asymmetric cross-sectional shape.

18. The microneedle structure of claim 16 , wherein said fluid flow channel has an elongated rounded cross-sectional shape.

19. The microneedle structure of claim 16 , wherein said fluid flow channel has a substantially elliptical cross-sectional shape.

20. The microneedle structure of claim 16 , wherein said fluid flow channel has a substantially triangular cross-sectional shape.

Priority Claims (1)
IL 138131 · Aug 28, 2000 · national
Continuity (3)
Continuation 1036283500
Continuation In Part 0967717500 · Oct 2, 2000
Related Publication 20100106105A1 · Apr 29, 2010