Intracranial electrode and method for producing same

1. A method for producing an intracranial electrode comprising the steps of:

obtaining three-dimensional data of a brain shape;

with use of the three-dimensional data, forming a sheet-shaped mold having a three-dimensional shape of a gyrus or sulcus surface, or an interhemispheric fissure or interlobar fissure surface;

with use of the mold, forming a sheet-shaped structure which (i) is made of a biocompatible material and (ii) has the three-dimensional shape of the gyrus or sulcus surface, or the interhemispheric fissure or interlobar fissure surface; and

arranging an electrode on at least one side of the structure.

2. The method as set forth in claim 1 , further comprising the steps of:

forming another mold which fits closely with a front side or a back side of the mold;

arranging the biocompatible material between the mold and the another mold;

and forming the sheet-shaped structure by pressing the mold and the another mold against each other with pressure.

3. The method as set forth in claim 1 , wherein: the mold is formed by attaching a sheet-shaped material to a surface of a model with pressure, the model having the brain shape formed with use of the three-dimensional data.

4. The method for producing an intracranial electrode as set forth in claim 1 , wherein: the mold is formed by applying a material to a surface of a model having the brain shape formed with use of the three-dimensional data, and subsequently pressing a supplemental mold to the surface of the model with pressure, the supplemental mold covering the material.

5. The method for producing an intracranial electrode as set forth in claim 1 , wherein: the mold is formed by a three-dimensional printer or a three-dimensional optical molding machine with use of the three-dimensional data.

6. The method for producing an intracranial electrode as set forth in claim 1 , further comprising the steps of:

with use of the mold, forming a first sheet-shaped member which (i) is made of a biocompatible material and (ii) has a three-dimensional shape of the gyrus or sulcus surface, or the interhemispheric fissure or interlobar fissure surface;

with use of the mold, forming a second sheet-shaped member which (i) is made of a biocompatible material and (ii) has a three-dimensional shape of the gyrus or sulcus surface, or the interhemispheric fissure or interlobar fissure surface; and

forming the sheet-shaped structure by attaching the first sheet-shaped member and the second sheet-shaped member together.

7. The method for producing an intracranial electrode as set forth in claim 6 , wherein: the mold for forming the first sheet-shaped member is different from the mold for forming the second sheet-shaped member.

8. The method for producing an intracranial electrode as set forth in claim 1 , wherein: the three-dimensional data of the brain shape is obtained based on a brain image obtained by magnetic resonance imaging.

9. The method for producing an intracranial electrode as set forth in claim 1 , wherein: the electrode is provided at a position at which the electrode will not contact with a blood vessel.

10. The method for producing an intracranial electrode as set forth in claim 1 , further comprising the step of: in the sheet-shaped structure, forming a recess at a position which corresponds to a blood vessel on the brain surface.

11. An intracranial electrode, comprising:

a structure which (i) has a sheet-shape and (ii) is made of a biocompatible material, the structure having a three-dimensional shape of a gyrus or sulcus surface, or an interhemispheric fissure or interlobar fissure surface; and

the structure including at least one electrode.

12. The intracranial electrode as set forth in claim 11 , wherein:

the structure includes at least a first layer and a second layer;

the structure has a multilayered structure whose outermost layers are the first layer and the second layer respectively;

at least one hole is formed in at least one of the first layer and the second layer;

and the electrode is provided in the hole.

13. The intracranial electrode as set forth in claim 11 , wherein: the electrodes are provided on both sides of the structure.

14. The intracranial electrode as set forth in claim 11 , wherein: the structure has a region in which a plurality of electrodes is arranged in high density; and

intervals between the adjacent electrodes in the region are in a range of 0.3 mm to 10 mm.

15. The intracranial electrode as set forth in claim 11 , wherein: the electrode is provided at a position at which the electrode will not contact with a blood vessel.

16. The intracranial electrode as set forth in claim 11 , wherein: in the sheet-shaped structure, a recess is formed at a position which corresponds to a blood vessel on the brain surface.

17. Brain treatment with electrical stimulation, wherein: electrical stimulation is applied to a gyrus or sulcus surface, or an interhemispheric fissure or interlobar fissure surface by using the intracranial electrodes as set forth in claim 11 .