IP Library › Granted Patent US 7,863,101
Granted Patent B2
US 7,863,101 · App. 12/501,939 · Granted Jan 4, 2011

Stacking semiconductor device and production method thereof

Assignee: Canon Kabushiki Kaisha
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Quick Facts
Patent No.
US 7,863,101
App. No.
12/501,939
Granted
Jan 4, 2011
Kind
B2
Abstract

In a stacking semiconductor device in which a first-layer and a second-layer semiconductor devices are stacked and bonded with a solder, warpage occurs due to a difference in thermal expansion coefficient of constituent members or a difference in elastic modulus of individual members. Therefore, between the first-layer and the second-layer semiconductor devices are provided an external connection terminal of solder and a thermosetting resin, and the stacking semiconductor device is heated at 150 to 180° C., which are the temperatures of preheating for reflow of the solder, for 30 to 90 seconds. Thereby the warpage of the first-layer semiconductor device is reduced and the thermosetting resin is cured completely in this state. Then, the temperature is raised to a reflow temperature of the solder and solder bonding using the external connection terminal is performed. Thereby, the bonding reliability of a solder-bonded portion of the stacking semiconductor device is considerably improved.

Claims (7)

1. A method of producing a stacked semiconductor device having a first-layer semiconductor device and a second-layer semiconductor device formed by being staked on each other, comprising the steps of:

disposing the second-layer semiconductor device on the first-layer semiconductor device which is warped

providing, between a first-layer semiconductor device and a second-layer semiconductor device, solder and a thermosetting resin for bonding the first-layer semiconductor device and the second-layer semiconductor device;

heating the first-layer semiconductor device and the second-layer semiconductor device to a first temperature at which the first-layer semiconductor device has a flat shape to cure the thermosetting resin;

heating the first-layer semiconductor device and the second-layer semiconductor device to a second temperature which is higher than the first temperature to melt the solder; and

cooling the first-layer semiconductor device and the second-layer semiconductor device to solidify the solder.

2. The method according to claim 1 , wherein the curing temperature of the thermosetting resin is 150 to 180° C. and the heating time is 30 to 90 seconds.

Priority Claims (2)
JP 2005-250511 · Aug 31, 2005 · national
JP 2006-224310 · Aug 21, 2006 · national
Continuity (2)
Division 1146818100 · Aug 29, 2006
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