Semiconductor device and method for manufacturing the same
View Patent ↗An object of the present invention is to provide a semiconductor device which has flexibility and resistance to a physical change such as bending and a method for manufacturing the semiconductor device. A semiconductor device of the present invention includes a plurality of transistors provided over a flexible substrate, each of which has a semiconductor film, a gate electrode provided over the semiconductor film with a gate insulating film therebetween, and an interlayer insulating film provided to cover the gate electrode, and a bending portion provided between the plurality of transistors, in which the bending portion is provided by filling an opening formed in the interlayer insulating film with a material having a lower elastic modulus, a material having a lower glass transition point, or a material having a higher plasticity than that of the interlayer insulating film.
1. A semiconductor device comprising:
a flexible substrate;
a transistor over the flexible substrate;
a first insulating film having a first opening, over the transistor and the flexible substrate;
a first conductive film over the first insulating film, electrically connected to the transistor; and
a second insulating film having a second opening, over the first conductive film and the first insulating film; and
a material in the first opening and the second opening,
wherein the first opening overlaps with the second opening, and
wherein the material is in contact with the first insulating film, the second insulating film and the flexible substrate.
2. The semiconductor device according to claim 1 , wherein the material has a lower elastic modulus than that of the first and the second insulating films.
3. The semiconductor device according to claim 1 , wherein the material has a lower glass transition point than that of the first and the second insulating films.
4. The semiconductor device according to claim 1 , wherein the material has higher plasticity than that of the first and the second insulating films.
5. The semiconductor device according to claim 1 , wherein the material is a metal having a high ductility and malleability property.
6. The semiconductor device according to claim 1 , wherein the flexible substrate has an uneven pattern, and
wherein the uneven pattern overlaps with the first opening.
7. A semiconductor device comprising:
a flexible substrate;
a transistor over the flexible substrate;
a first insulating film having a first opening, over the transistor and the flexible substrate;
a first conductive film over the first insulating film, electrically connected to the transistor; and
a second insulating film having a second opening, over the first conductive film and the first insulating film;
a second conductive film over the second insulating film;
a third insulating film over the second conductive film; and
a material in the first opening and the second opening,
wherein the first opening overlaps with the second opening, and
wherein the material is in contact with the first insulating film, the second insulating film and the flexible substrate.
8. The semiconductor device according to claim 7 , wherein the second conductive film is an antenna.
9. The semiconductor device according to claim 7 , wherein the third insulating film is flexible and is in contact with the flexible substrate.
10. The semiconductor device according to claim 7 , wherein the material has a lower elastic modulus than that of the first and the second insulating films.
11. The semiconductor device according to claim 7 , wherein the material has a lower glass transition point than that of the first and the second insulating films.
12. The semiconductor device according to claim 7 , wherein the material has higher plasticity than that of the first and the second insulating films.
13. The semiconductor device according to claim 7 , wherein the material is a metal having a high ductility and malleability property.
14. The semiconductor device according to claim 7 , wherein the flexible substrate has an uneven pattern, and
wherein the uneven pattern overlaps with the first opening.
15. A semiconductor device comprising a first pixel and a second pixel adjacent to the first pixel, the semiconductor device comprising:
a flexible substrate;
a first transistor for the first pixel;
a second transistor for the second pixel;
a first insulating film over the flexible substrate, the first transistor, and the second transistor, wherein the first insulating film has a first opening between the first pixel and the second pixel;
a first conductive film for the first pixel, the first conductive film electrically connected to the first transistor;
a second conductive film for the second pixel, the second conductive film electrically connected to the second transistor;
a second insulating film over the first insulating film, the first conductive film and the second conductive film, wherein the second insulating film has a second opening between the first pixel and the second pixel;
a third conductive film for the first pixel, wherein the third conductive film is over the second insulating film and electrically connected to the first conductive film;
a fourth conductive film for the second pixel, wherein the fourth conductive film is over the second insulating film and electrically connected to the second conductive film; and
a material in the first opening and the second opening,
wherein the first opening overlaps with the second opening, and
wherein the material is in contact with the first insulating film, the second insulating film and the flexible substrate.
16. The semiconductor device according to claim 15 , wherein the material has a lower elastic modulus than that of the first and the second insulating films.
17. The semiconductor device according to claim 15 , wherein the material has a lower glass transition point than that of the first and the second insulating films.
18. The semiconductor device according to claim 15 , wherein the material has higher plasticity than that of the first and the second insulating films.
19. The semiconductor device according to claim 15 , wherein the material is a metal having a high ductility and malleability property.
20. The semiconductor device according to claim 15 , wherein the flexible substrate has an uneven pattern, and
wherein the uneven pattern overlaps with the first opening.