MEMS apparatus and method of manufacturing the same
A MEMS apparatus includes a MEMS unit formed on a semiconductor substrate and a cover provided with a pore and serving to seal the MEMS unit. The pore is sealed with a sealing material shaped in a sphere or a hemisphere.
1. A MEMS apparatus comprising:
a MEMS unit formed on a semiconductor substrate;
a cover provided with a pore and serving to seal the MEMS unit, wherein the pore is sealed with a sealing material shaped in a sphere or a hemisphere; and
a coat that is deposited on the cover and the sealing material and joins the cover and the sealing material on the cover.
2. The apparatus according to claim 1 , wherein a dimension of the shape of the sphere or the hemisphere of the sealing material is larger than the dimension of the shape of the pore.
3. The apparatus according to claim 1 , further comprising a hollow portion between the MEMS unit and the cover.
4. A MEMS apparatus comprising:
a MEMS unit formed on a semiconductor substrate;
a cover provided with a pore and serving to seal the MEMS unit, wherein the pore is sealed with a sealing material that is a substrate having a sphere or a hemisphere shaped portion on a surface of the substrate; and
a coat that is deposited on the cover and the sealing material and joins the cover and the sealing material on the cover.
5. The apparatus according to claim 4 , wherein a dimension of the shape of the sphere or the hemisphere of the sealing material is larger than the dimension of the shape of the pore.
6. The apparatus according to claim 4 , further comprising a coat that joins the cover and the sealing material on the cover.
7. The apparatus according to claim 4 , further comprising a hollow portion between the MEMS unit and the cover.
8. A method of manufacturing a MEMS apparatus, in a semiconductor substrate having a MEMS unit formed thereon, with an upper part of the MEMS unit being covered by a film with a pore, and a hollow portion being formed between the MEMS unit and the film, the method comprising:
filling a sealing material shaped in a sphere or a hemisphere in the pore; and
depositing a coat that covers the film and the sealing material.
9. A method of manufacturing a MEMS apparatus, in a semiconductor substrate having a MEMS unit formed thereon, with an upper part of the MEMS unit being covered by a film with a pore, and a hollow portion being formed between the MEMS unit and the film, the method comprising:
filling in the pore a sphere or a hemisphere shaped portion formed on a surface of a sealing material that is a substrate; and
depositing a coat that covers the film and the sealing material.