Semiconductor device
A semiconductor device has a first and a second active regions of a first conductivity type disposed on a semiconductor substrate, a third and a fourth active regions of a second conductivity type disposed on the semiconductor substrate, the second and the fourth active regions having sizes larger than those of the first and the third active regions respectively, a first electroconductive pattern disposed adjacent to the first active region and having a first width, a second electroconductive pattern disposed adjacent to the second active region and having a second width larger than the first width, a third electroconductive pattern disposed adjacent to the third active region and having a third width; and a fourth electroconductive pattern disposed adjacent to the fourth active region and having a fourth width smaller than the third width.
1. A semiconductor device comprising:
a first and a second active regions of a first conductivity type disposed on a semiconductor substrate;
a third and a fourth active regions of a second conductivity type disposed on the semiconductor substrate, the second and the fourth active regions having sizes larger than those of the first and the third active regions respectively;
a first electroconductive pattern disposed over the first active region and having a first width;
a second electroconductive pattern disposed over the second active region and having a second width larger than the first width;
a third electroconductive pattern disposed over the third active region and having a third width; and
a fourth electroconductive pattern disposed over the fourth active region and having a fourth width smaller than the third width, wherein
the first electroconductive pattern is electrically connected to the third electroconductive pattern,
the second electroconductive pattern is electrically connected to the fourth electroconductive pattern, and
the second width is the same as the fourth width.
2. The semiconductor device according to claim 1 , wherein a distance between one end of the first active region and one sidewall of the first electroconductive pattern is smaller than a distance between one end of the second active region and one sidewall of the second electroconductive pattern, and a distance between one end of the third active region and one sidewall of the third electroconductive pattern is smaller than a distance between one end of the fourth active region and one sidewall of the fourth electroconductive pattern.
3. The semiconductor device according to claim 1 , wherein the third width is larger than the first width.
4. The semiconductor device according to claim 1 , wherein the first active region, the second active region, the third active region, and the fourth active region are individually surrounded by a device isolation region on the semiconductor substrate.
5. The semiconductor device according to claim 4 , wherein a trench is in the device isolation region and an insulating layer is embedded in the trench.
6. The semiconductor device according to claim 5 , wherein the top surfaces of the first active region, the second active region, the third active region, and the fourth active region are higher than the top surface of the insulating layer.
7. The semiconductor device according to claim 1 , wherein the first electroconductive pattern is a first gate electrode of a first transistor of a first conductivity type, the second electroconductive pattern is a second gate electrode of a second transistor of the first conductivity type, the third electroconductive pattern is a third gate electrode of a third transistor of a second conductivity type, and the fourth electroconductive pattern is a fourth gate electrode of a fourth transistor of the second conductivity type.
8. The semiconductor device according to claim 7 , wherein a first source/drain region of the first transistor formed in the first active region has a same impurity depth profile as a second source/drain region of the second transistor formed in the second active region, and a third source/drain region of the third transistor formed in the third active region has a same impurity depth profile as a fourth source/drain region of the fourth transistor formed in the fourth active region.
9. A semiconductor device comprising:
a first and a second active regions of a first conductivity type disposed on a semiconductor substrate;
a third and a fourth active regions of a second conductivity type disposed on the semiconductor substrate, the second and the fourth active regions having sizes larger than those of the first and the third active regions respectively;
a first electroconductive pattern disposed over the first active region and having a first width;
a second electroconductive pattern disposed over the second active region and having a second width larger than the first width;
a third electroconductive pattern disposed over the third active region and having a third width; and
a fourth electroconductive pattern disposed over the fourth active region and having a fourth width smaller than the third width, wherein
the first electroconductive pattern is a first gate electrode of a first transistor of a first conductivity type,
the second electroconductive pattern is a second gate electrode of a second transistor of the first conductivity type,
the third electroconductive pattern is a third gate electrode of a third transistor of a second conductivity type,
the fourth electroconductive pattern is a fourth gate electrode of a fourth transistor of the second conductivity type, and
gate insulating layers formed between the semiconductor substrate and the first gate electrode, the second gate electrode, the third gate electrode, and fourth gate electrode have the same thickness.