Production method for electroluminescent element
The present invention provides a method for manufacturing an EL element including an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer, a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.
1. A method for manufacturing an electroluminescent element comprising:
a first light emitting layer forming process of forming a first light emitting layer on a substrate on which at least an electrode layer is formed in a pattern;
a first peeling layer forming process of forming a first peeling layer on the first light emitting layer;
a first photoresist layer forming process of forming a first photoresist layer on the first peeling layer;
a first photoresist layer patterning process of patterning, by exposing and developing the first photoresist layer, so that the first photoresist layer remains only in an area where a first light emitting part will be formed;
a first light emitting layer developing process of removing the first peeling layer and the first light emitting layer in a part where the first photoresist layer is removed;
a second light emitting layer forming process of forming a second light emitting layer on a substrate on which at least the first light emitting part, formed by laminating the first light emitting layer, the first peeling layer and the first photoresist layer in this order, on a surface;
a second peeling layer forming process of forming a second peeling layer on the second light emitting layer,
a second photoresist layer forming process of forming a second photoresist layer on the second peeling layer;
a second photoresist layer patterning process of patterning, by exposing and developing the second photoresist layer, so that the second photoresist layer remains at least in an area where the first light emitting part formed and an area where a second light emitting part will be formed;
a second light emitting layer developing process of removing the second peeling layer and the second light emitting layer in a part where the second photoresist layer is removed;
a third light emitting layer forming process of forming a third light emitting layer on a substrate on which at least the first light emitting part, formed by laminating the first light emitting layer, the first peeling layer, the first photoresist layer, the second light emitting layer, the second peeling layer and the second photoresist layer in this order, on the surface, and the second light emitting part, formed by laminating the second light emitting layer, the second peeling layer and the second photoresist layer in this order, on the surface;
a third peeling layer forming process of forming a third peeling layer on the third light emitting layer;
a third photoresist layer forming process of forming a third photoresist layer on the third peeling layer;
a third photoresist layer patterning process of patterning, by exposing and developing the third photoresist layer, so that the third photoresist layer remains at least in an area where the first light emitting part and the second light emitting part formed and an area where a third light emitting part will be formed;
a third light emitting layer developing process of removing the third peeling layer and the third light emitting layer in a part where the third photoresist layer is removed; and
a peeling layer peeling process of removing the following by peeling off each of the peeling layer;
the first peeling layer, the first, photoresist layer, the second light emitting layer, the second peeling layer, the second photoresist layer, the third light emitting layer, the third peeling layer and the third photoresist layer in the first light emitting part,
the second peeling layer, the second photoresist layer, the third light emitting layer, the third peeling layer and the third photoresist layer in the second light emitting part, and
the third peeling layer and the third photoresist layer in the third light emitting part,
wherein each peeling material used for forming each of the peeling layer is insoluble to each photoresist layer forming solvent used for forming each of the photoresist layer, and
a solubility of each peeling layer forming solvent used for forming each of the peeling layer to each of the light emitting layer at 25° C. and 1 atmospheric pressure is 0.001 (g/g solvent) or less.
2. The method for manufacturing an electroluminescent element according to claim 1 , wherein each the peeling layer is insoluble to each photoresist layer forming solvent used for forming each the photoresist layer, and a material insoluble to each peeling layer forming solvent used for forming each the peeling layer is used for each the light emitting layer.
3. The method for manufacturing an electroluminescent element according to claim 1 or 2 , wherein each of the peeling layer is insoluble to each photoresist developing agent used for developing each of the photoresist layer.
4. The method for manufacturing an electroluminescent element according to claim 1 or 2 , wherein each of the peeling layer is soluble to each photoresist developing agent used for developing each of the photoresist layer, and each of the light emitting layer is insoluble to each of the photoresist developing agent.
5. The method for manufacturing an electroluminescent element according to claim 1 to 2 , wherein a film thickness of each of the peeling layer is in a range of 0.05 μm to 5 μm.
6. The method for manufacturing an electroluminescent element according to claim 1 to 2 , wherein each of the light emitting layer developing process is a process of using a dry etching method.