Nano imprint technique with increased flexibility with respect to alignment and feature shaping
By forming metallization structures on the basis of an imprint technique, in which via openings and trenches may be commonly formed, a significant reduction of process complexity may be achieved due to the omission of at least one further alignment process as required in conventional process techniques. Furthermore, the flexibility and efficiency of imprint lithography may be increased by providing appropriately designed imprint molds in order to provide via openings and trenches exhibiting an increased fill capability, thereby also improving the performance of the finally obtained metallization structures with respect to reliability, resistance against electromigration and the like.
1. A method, comprising:
commonly imprinting a via opening and a trench into a moldable material layer formed above a substrate, said via opening and said trench corresponding to features of a metallization structure of a microstructure device;
forming a via and a conductive line on the basis of said via opening and said trench by substantially completely filling said via opening and said trench with a conductive material;
substantially removing said moldable material layer to expose surface portions of said via and said conductive line; and
forming a conductive barrier layer on the exposed surface portions to encompass said via and said conductive line.
2. The method of claim 1 , wherein said moldable material layer comprises a dielectric material having a relative permittivity of approximately 3.0 or less.
3. The method of claim 1 , further comprising removing residues of said moldable material layer from a bottom of said via opening prior to forming said via and said conductive line.
4. The method of claim 1 , further comprising forming an imprint mold representing a negative image of said via and said conductive line and commonly imprinting said via opening and said trench into a plurality of moldable material layers provided above a plurality of substrates.
5. The method of claim 4 , wherein forming said imprint mold comprises performing a lithography process and an etch process for patterning a mold substrate so as to receive said negative image of said via opening and said trench.
6. The method of claim 4 , wherein said imprint mold is formed by an imprint process.