Extreme ultra violet light source apparatus
View Patent ↗In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.
1. An extreme ultra violet light source apparatus of a laser produced plasma type for generating extreme ultra violet light by applying a laser beam to a target material, said apparatus comprising:
a chamber in which extreme ultra violet light is generated;
target supply means for supplying a target material to a predetermined position within said chamber;
a driver laser for applying a laser beam to the target material supplied by said target supply means to generate plasma;
a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light;
magnetic field forming means for forming an asymmetric magnetic field in a generation position of the plasma by using a coil; and
a charged particle collection mechanism provided on at least one of two surfaces of said chamber to which lines of magnetic force generated by said coil extend.
2. The extreme ultra violet light source apparatus according to claim 1 , wherein said collector mirror is arranged to be substantially in parallel with the lines of magnetic force generated by said coil.
3. The extreme ultra violet light source apparatus according to claim 1 , wherein said chamber and said coil can be separated from each other.
4. The extreme ultra violet light source apparatus according to claim 2 , wherein said chamber and said coil can be separated from each other.
5. The extreme ultra violet light source apparatus according to claim 3 , wherein a caster to be used when said chamber is separated from said coil and moved is provided on said chamber.
6. The extreme ultra violet light source apparatus according to claim 4 , wherein a caster to be used when said chamber is separated from said coil and moved is provided on said chamber.
7. The extreme ultra violet light source apparatus according to claim 1 , wherein said charged particle collection mechanism includes:
a collecting pipe for collecting charged particles; and
an exhaust pump for guiding the charged particles staying within said chamber to said collecting pipe.