IP Library Granted Patent US 7,959,975
Granted Patent B2
US 7,959,975 · App. 11/787,928 · Granted Jun 14, 2011

Methods of patterning a substrate

Assignee: Micron Technology, Inc.
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Quick Facts
Patent No.
US 7,959,975
App. No.
11/787,928
Granted
Jun 14, 2011
Kind
B2
Abstract

A method of patterning a substrate is disclosed. An ink material is chemisorbed to at least one region of a stamp and the chemisorbed ink material is transferred to a receptor substrate. The ink material has greater chemical affinity for the receptor substrate than for the at least one region of the stamp. A method of forming the stamp is also disclosed, as are the stamp and a patterning system.

Claims (54)

1. A method of patterning a substrate, comprising:

chemisorbing an ink material to at least one region of a stamp, the ink material comprising at least one of an acetylenic carboxylate, an acetylenic sulfonate, and an acetylenic thiol; and transferring the chemisorbed ink material to a receptor substrate.

2. The method of claim 1 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material, comprised of acetylenic thiol, to the stamp surface by dithiol linkages or gold-thiol bonds.

3. The method of claim 1 , wherein transferring the chemisorbed ink material to a receptor substrate comprises cleaving bonds between the stamp and the ink material.

4. The method of claim 1 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material to gold, a compound containing at least one thiol functional group, a compound containing at least one amine functional group or combinations thereof.

5. The method of claim 1 , wherein transferring the chemisorbed ink material to a receptor substrate comprises forming a self-assembled monolayer on the receptor substrate.

6. The method of claim 5 , further comprising depositing an oxide on a portion of the receptor substrate, the portion of the receptor substrate being free of the self-assembled monolayer, subsequent to transferring the chemisorbed ink material to a receptor substrate.

7. The method of claim 1 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and a compound selected from the group consisting of grafted glycidoxypropyl(trialkoxy)silane, grafted azidoalkyl(trialkoxy)silane and isocyanatopropyl(trialkoxy)silane.

8. The method of claim 1 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material comprising an acetylenic thiol functional group to a stamp comprising gold or a compound containing at least one thiol functional group.

9. The method of claim 8 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and grafted 6-azidosulfonylhexyl(triethoxy)silane or 11-azidoundecyl(triethyloxy)silane.

10. The method of claim 1 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising Si—Cl from hydrogen-terminated silicon.

11. The method of claim 1 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material to at least one region of the stamp, the stamp comprising silicon dioxide and an aminoalkyl(trialkoxy)silane compound.

12. The method of claim 11 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and grafted isocyanatopropyl(trialkoxy)silane.

13. The method of claim 1 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material selected from the group consisting of an acetylenic carboxylate and an acetylenic sulfonate to a stamp comprising silicon dioxide and a grafted aminoalkyl silane compound.

14. The method of claim 13 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and 6-azidosulfonylhexyl(triethoxy)silane or a grafted azidoalkyl silane.

15. The method of claim 1 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing an ink material to a receptor substrate comprising silicon dioxide and a grafted mercaptoalkyl silane compound.

16. The method of claim 15 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and 6-azidosulfonylhexyl(triethoxy)silane or a grafted azidoalkyl silane.

17. The method of claim 1 , further comprising simultaneously chemisorbing the ink material to the at least one region of the stamp and chemisorbing a second ink material to a second region of the stamp, wherein the second region is chemically differentiated from the at least one region.

18. The method of claim 1 , wherein transferring the chemisorbed ink material to a receptor substrate comprises forming a patterned self-assembled monolayer on the receptor substrate and further comprising depositing a block copolymer over the patterned self-assembled monolayer and annealing the block copolymer to enable self-assembly of the block copolymer.

19. A method of patterning a substrate, comprising:

contacting at least one region of a stamp with an ink material having a chemical affinity for the at least one region of the stamp, the ink material comprising at least one of an acetylenic carboxylate, an acetylenic sulfonate, and an acetylenic thiol; and

contacting a substrate with the ink material adhered to the region of the stamp, the substrate having a greater chemical affinity for the ink material than the at least one region of the stamp.

20. The method of claim 19 , further comprising washing the at least one region of the stamp to remove physisorbed ink material therefrom.

21. The method of claim 19 , further comprising removing the stamp, leaving the ink material on portions of the substrate previously contacting the at least one region of the stamp.

22. The method of claim 19 , wherein contacting at least one region of a stamp with an ink material comprises contacting at least one region of chemical differentiation on the stamp with the ink material.

23. The method of claim 19 , wherein contacting at least one region of a stamp with an ink material comprises contacting at least one topographical feature on the stamp with the ink material.

24. The method of claim 19 , wherein contacting a substrate with the ink material adhered to the region of the stamp comprises contacting the substrate with the ink material chemisorbed to the at least one region of the stamp.

25. The method of claim 19 , wherein contacting a substrate with the ink material adhered to the at least one region of the stamp comprises covalently bonding the substrate with the ink material adhered to the at least one region of the stamp.

26. A method of patterning a receptor substrate, comprising:

depositing a block copolymer over a stamp substrate;

annealing the block copolymer to form at least two polymer domains overlying the stamp substrate;

chemisorbing an ink material to at least one of the at least two polymer domains overlying the stamp substrate; and

transferring the ink material chemisorbed to the at least one of the at least two polymer domains to the receptor substrate.

27. The method of claim 26 , wherein chemisorbing an ink material to at least one of the at least two polymer domains overlying the stamp substrate comprises chemisorbing the ink material to at least one pattern defined by a plurality of lamellae formed from the at least one of the at least two polymer domains.

28. The method of claim 26 , wherein chemisorbing an ink material to at least one of the at least two polymer domains overlying the stamp substrate comprises chemisorbing an ink material having different functional groups on opposite ends of thereof.

29. The method of claim 26 , wherein chemisorbing an ink material to at least one of the at least two polymer domains overlying the stamp substrate comprises chemisorbing the ink material to a first polymer domain of the block copolymer without chemisorbing the ink material to a second polymer domain of the block copolymer, the first polymer domain having a chemical affinity different than the second polymer domain of the block copolymer.

30. The method of claim 26 , wherein transferring the ink material chemisorbed to the at least one of the at least two polymer domains to the receptor substrate comprises contacting the ink material chemisorbed to the at least one of the at least two polymer domains with a receptor substrate having a greater chemical affinity for the ink material than the at least one of the at least two polymer domains.

31. The method of claim 30 , wherein contacting the ink material chemisorbed to the at least one of the at least two polymer domains with a receptor substrate having a greater chemical affinity for the ink material than the at least one of the at least two polymer domains comprises covalently bonding the ink material chemisorbed to the at least one of the at least two polymer domains to the receptor substrate.

32. A method of patterning a substrate, comprising:

chemisorbing an ink material to at least one region of a stamp; and

transferring the chemisorbed ink material to a pattern on a receptor substrate comprising:

forming a patterned self-assembled monolayer on the receptor substrate;

depositing a block copolymer over the patterned self-assembled monolayer; and

annealing the block copolymer to enable self-assembly of the block copolymer into a pattern.

33. The method of claim 32 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material to the stamp surface by dithiol linkages or gold-thiol bonds.

34. The method of claim 32 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material to gold, a compound containing at least one thiol functional group, a compound containing at least one amine functional group or combinations thereof.

35. The method of claim 32 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material comprising an acetylenic thiol functional group to a stamp comprising gold or a compound containing at least one thiol functional group.

36. The method of claim 32 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and grafted 6-azidosulfonylhexyl(triethoxy)silane or 11-azidoundecyl(triethyloxy)silane.

37. The method of claim 32 , wherein chemisorbing an ink material to at least one region of a stamp comprises chemisorbing the ink material selected from the group consisting of an acetylenic carboxylate and an acetylenic sulfonate to a stamp comprising silicon dioxide and a grafted aminoalkyl silane compound.

38. The method of claim 32 , wherein transferring the chemisorbed ink material to a receptor substrate comprises transferring the chemisorbed ink material to a receptor substrate comprising silicon dioxide and 6-azidosulfonylhexyl(triethoxy)silane or a grafted azidoalkyl silane.

39. A method of patterning a substrate, comprising:

chemisorbing an ink material to at least one region of a stamp;

transferring the chemisorbed ink material to a first portion of a receptor substrate; and

depositing an oxide on a second portion of the receptor substrate subsequent to transferring the chemisorbed ink material to a first portion of a receptor substrate, the second portion of the receptor substrate being free of the ink material.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 18, 2007
From: MILLWARD, DAN B.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 019214/0796 →
Continuity (1)
Related Publication 20080257187A1 · Oct 23, 2008