Apparatus for removing photoresist film
A photoresist film removing apparatus includes a reacting chamber, an ozonizer producing a gas supplied to the reacting chamber, and an exhaust system that exhausts the gas from the reacting chamber. A source of a photoresist film-remover is located opposite a stage carrying a substrate covered with photoresist. Photoresist film-remover and the gas are supplied to the substrate through apertures. An electric field may be generated between the source of the photoresist film-remover and the substrate. Alternatively, a centrally located feed tube supplies only one of the gas and the photoresist film-remover through a single aperture and a reservoir discharges the other through apertures. The reservoir surrounds and is sealed to the feed tube. The apparatus may include a container holding a liquid photoresist film-remover and a mixture of the gas and remover is supplied from outside the reacting chamber to the substrate.
1. An apparatus for removing a photoresist film from a surface of a substrate in a sealed system, the apparatus comprising:
a reacting chamber,
an ozonizer producing an ozonized supplied to the reacting chamber,
an exhaust system exhausting the ozonized gas from the reacting chamber,
a stage for mounting of a substrate having a surface covered with a photoresist film,
a photoresist film-remover supplier disposed opposite the stage, the stage and the photoresist film-remover supplier being disposed in the reacting chamber,
means for supplying a photoresist film-remover and the ozonized gas to the surface of the substrate through apertures in the photoresist film-remover supplier, and
means for generating an electric field between the photoresist film-remover supplier and the substrate.
2. The apparatus for removing a photoresist film according to claim 1 , wherein the reacting chamber is selected from the group consisting of stainless steel, polytetrafluoro ethylene coated stainless steel, polytetrafluoroethylene resin, ceramics, polytetrafluoroethylene-coated ceramics, and combinations thereof.
3. The apparatus for removing a photoresist film according to claim 1 , further comprising means for heating the stage.
4. The apparatus for removing a photoresist film according to claim 1 , wherein a surface of the photoresist film and the photoresist film-remover supplier are separated by a distance within a range of 1 to 5 mm.
5. The apparatus for removing a photoresist film according to claim 1 , further comprising means for cooling the photoresist film-remover.
6. An apparatus for removing a photoresist film from a surface of a substrate in a sealed system, the apparatus comprising:
a reacting chamber,
an ozonizer producing an ozonized gas supplied to the reacting chamber,
an exhaust system exhausting the ozonized gas from the reacting chamber,
a stage for mounting of a substrate having a surface covered with a photoresist film,
a photoresist film-remover supplier disposed opposite the stage, the stage and the photoresist film-remover supplier being disposed in the reacting chamber, and
means for supplying a photoresist film-remover and the ozonized gas to the surface of the substrate through apertures in the photoresist film-remover supplier, the photoresist film-remover supplier including
a feed tube centrally located in the means for supplying and having a single aperture discharging toward the substrate only one of the ozonized gas and the photoresist film-remover, and
a reservoir including a plurality of apertures discharging toward the substrate the other of the ozonized gas and the photoresist film-remover, wherein the reservoir surrounds and is sealed with respect to the feed tube.
7. The apparatus for removing a photoresist film according to claim 6 , wherein the reacting chamber is selected from the group consisting of stainless steel, polytetrafluoroethylene coated stainless steel, polytetrafluoroethylene resin, ceramics, polytetrafluoroethylene-coated ceramics, and combinations thereof.
8. The apparatus for removing a photoresist film according to claim 6 , further comprising means for heating the stage.
9. The apparatus for removing a photoresist film according to claim 6 , further comprising means for cooling the photoresist film-remover.
10. The apparatus for removing a photoresist film according to claim 6 , wherein a surface of the photoresist film and the photoresist film-remover supplier are separated by a distance within a range of 1 to 5 mm.
11. An apparatus for removing a photoresist film from a surface of a substrate in a sealed system, the apparatus comprising:
a reacting chamber,
an ozonizer producing an ozonized gas supplied to the reacting chamber,
an exhaust system exhausting the ozonized gas from the reacting chamber,
a stage for mounting of a substrate having a surface covered with a photoresist film,
a photoresist film-remover supplier disposed opposite the stage, the stage and the photoresist film-remover supplier being disposed in the reacting chamber,
a container for holding a liquid photoresist film-remover, and
an ejector for mixing the ozonized gas and a photoresist film remover to produce a photoresist film-removal mixture including the photoresist film-remover and the ozonized gas, the container and the ejector being disposed outside the reacting chamber, and
means for supplying the photoresist film-removal mixture to the surface of the substrate through apertures in the photoresist film-remover supplier, wherein the photoresist film-remover supplier includes a peripheral reservoir including a plurality of apertures, surrounding a central portion free of apertures, discharging toward the substrate the photoresist film-removal mixture.
12. The apparatus for removing a photoresist film according to claim 11 , wherein the reacting chamber is selected from the group consisting of stainless steel, polytetrafluoroethylene coated stainless steel, polytetrafluoroethylene resin, ceramics, polytetrafluoroethylene-coated ceramics, and combinations thereof.
13. The apparatus for removing a photoresist film according to claim 11 , further comprising means for heating the stage.
14. The apparatus for removing a photoresist film according to claim 11 , further comprising means for cooling the photoresist film-remover.
15. The apparatus for removing a photoresist film according to claim 11 , wherein a surface of the photoresist film and the photoresist film-remover supplier are separated by a distance within a range of 1 to 5 mm.