Stage drive method and stage unit, exposure apparatus, and device manufacturing method

1. A lithographic projection apparatus, comprising:

a substrate table that holds a substrate;

a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table;

a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate table, or both, and that forms a part of a boundary of the space;

a closing plate that forms a part of the boundary of the space in place of the substrate, the substrate table, or both; and

a drive system that independently moves the substrate table and the closing plate, wherein

the closing plate has a measurement member on which a beam of radiation is irradiated via the projection system and the liquid, and

the drive system moves the substrate table and the closing plate in a horizontal plane while the substrate table and the closing plate are close together or in contact, to form a part of the boundary of the space using the closing plate in place of the substrate, the substrate table or both, or to form a part of the boundary of the space using the substrate, the substrate table or both in place of the closing plate.

2. The apparatus according to claim 1 , wherein the drive system moves the closing plate in a same plane as the substrate, the substrate table, or both, to follow the substrate, the substrate table, or both, across the liquid confinement structure.

3. The apparatus according to claim 1 , wherein the substrate table and the closing plate are releasably coupleable.

4. The apparatus according to claim 1 , wherein the drive system includes a first drive system that moves the closing plate and a separate second drive system that moves the substrate table.

5. The apparatus according to claim 1 , wherein the closing plate is at a same vertical level as the substrate table and neither the closing plate nor the substrate table is moved out of the vertical level to replace the substrate, the substrate table, or both, with the closing plate as a part of the boundary of the space, or to replace the closing plate with the substrate, the substrate table, or both as a part of the boundary of the space.

6. A device manufacturing method, comprising:

providing a liquid to a space through which a patterned beam passes, a substrate, a substrate table, or both, forming a part of a boundary of the space;

maintaining the liquid to the space by maintaining the liquid between the substrate, the substrate table, or both, and another structure;

replacing the substrate, the substrate table, or both, with a closing plate as a part of the boundary of the space while preventing leakage of the liquid, by moving the closing plate that has a measurement member on which a beam of radiation is irradiated via the liquid and the substrate table in a horizontal plane while the closing plate and the substrate table are close together or in contact; and

projecting a patterned beam of radiation through the liquid onto the substrate.

7. The method according to claim 6 , wherein the replacing includes moving the closing plate in a same plane as the substrate, the substrate table, or both, to follow the substrate, the substrate table, or both.

8. The method according to claim 6 , further comprising releasably coupling the substrate table and the closing plate.

9. The method according to claim 6 , wherein the closing plate and the substrate table are separately moved.

10. The method according to claim 6 , wherein the closing plate is at a same vertical level as the substrate table and neither the closing plate nor the substrate table is moved out of the vertical level to replace the substrate, the substrate table, or both, with the closing plate as a part of the boundary of the space, or to replace the closing plate with the substrate, the substrate table, or both as a part of the boundary of the space.

11. A lithographic projection apparatus, comprising:

a substrate table that holds a substrate;

a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table;

a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate table, or both, and that forms a part of a boundary of the space;

a closing plate displaced in a horizontal plane from the substrate table and that forms a part of the boundary of the space in place of the substrate, the substrate table, or both; and

a drive system that moves the substrate table and the closing plate in the horizontal plane while the substrate table and the closing plate are close together or in contact, to replace the substrate, the substrate table or both with the closing plate as a part of the boundary of the space, wherein

the closing plate has a measurement member on which a beam of radiation is irradiated via the liquid.

12. The apparatus according to claim 11 , wherein the drive system moves the closing plate in a same plane as the substrate, the substrate table, or both, to follow the substrate, the substrate table, or both, across the liquid confinement structure.

13. The apparatus according to claim 11 , wherein the substrate table and the closing plate are releasably coupleable.

14. The apparatus according to claim 11 , further comprising a controller that separately controls the closing plate and the substrate table.

15. The apparatus according to claim 11 , wherein the closing plate is at a same vertical level as the substrate table and neither the closing plate nor the substrate table is moved out of the vertical level to replace the substrate, the substrate table, or both, with the closing plate as a part of the boundary of the space, or to replace the closing plate with the substrate, the substrate table, or both as a part of the boundary of the space.

16. The apparatus according to claim 11 , wherein the drive system comprises a first long stroke actuator that moves the closing plate and a second long stroke actuator that moves the substrate table.