IP Library Granted Patent US 7,976,692
Granted Patent B2
US 7,976,692 · App. 12/179,992 · Granted Jul 12, 2011

Metallization process for making fuser members

Assignee: Xerox Corporation
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Quick Facts
Patent No.
US 7,976,692
App. No.
12/179,992
Granted
Jul 12, 2011
Kind
B2
Abstract

The presently disclosed embodiments are directed to an improved metallization process for making fuser members which avoids the extra steps of metal seeding or special substrate treatment. In embodiments, a metallized substrate, formed via a polycatecholamine-assisted metallization process, is used for the complete fabrication of the fuser member.

Claims (23)

1. A process for forming a fuser member, comprising:

providing a substrate, wherein the substrate is a heat-resistant resin;

treating the substrate with a catecholamine coating solution to form a polycatecholamine layer;

electroless plating a thin metallized layer on the polycatecholamine layer by immersing the treated substrate into an electroless metal plating solution, wherein the polycatecholamine layer comprises a polymer product obtained from copolymerization of the catecholamine and an aminosilane coupling agent; and

electroplating the pre-metallized substrate in a metal plating solution to form a uniform metal layer on the thin metallized layer.

2. The process of claim 1 , wherein the catecholamine is selected from the group consisting of dopamine, norepinephrine, dihydroxyphenylalanine, polydopamine, and mixtures thereof.

3. The process of claim 1 , wherein the aminosilane coupling agent is selected from the group consisting of 3-aminopropyltrialkoxysilane, 3-aminopropyldialkoxymethylsilane, aminoethylaminopropyltrialkoxysilane, and mixtures thereof, wherein the alkoxy is selected from the group consisting of methoxy, ethoxy, and propoxy.

4. The process of claim 1 , wherein the catecholamine coating solution possesses a pH value of from about 2 to about 10.

5. The process of claim 1 , wherein the electroless plating solution comprises an electroless platable metal selected from the group consisting of copper, nickel, and silver.

6. The process of claim 1 , wherein the electroless plating solution further comprises a reducing agent.

7. The process of claim 6 , wherein the reducing agent is selected from the group consisting of hypophosphite, a hydrazine compound, an aldehyde compound, hydrogen borate, hydroxylamine, and a borane compound.

8. The process of claim 1 , wherein the electroless plating is repeated to form a thin metallized layer comprising a first metal being silver and a second metal being selected from the group consisting of copper and nickel.

9. The process of claim 1 , wherein the plating solution for electroplating comprises a platable metal selected from the group consisting of copper, nickel, and cobalt.

10. The process of claim 1 , wherein the resin comprises a polymer selected from the group consisting of polyimide, an aromatic polyimide, polyether imide, polyphthalamide, and polyester.

11. The process of claim 1 , wherein the thin metallized layer formed by the electroless plating has a thickness of from about 5 nanometers to about 3000 nanometers.

12. The process of claim 1 , wherein the uniform metal layer has a thickness of from about 5 micrometers to about 100 micrometers.

13. A process for forming a fuser member, comprising:

providing a polyimide substrate;

treating the polyimide substrate with a polymer solution comprising a dopamine compound and an aminosilane coupling agent, to form a polydopamine layer;

immersing the treated substrate into an electroless metal plating solution to form a thin metallized layer on the polydopamine layer; and

electroplating the substrate to form a uniform metal layer on the thin metallized layer.

14. The process of claim 13 , wherein the uniform metal layer comprises an electroplated copper layer with a thickness of from about 5 micrometers to about 50 micrometers, and an electroplated nickel layer with a thickness of from about 5 micrometers to about 50 micrometers.

15. The process of claim 13 further including depositing, in sequence, a first adhesive layer over the uniform metal layer, an elastic layer comprised of a silicone polymer over the adhesive layer, a second adhesive layer over the elastic layer, and an outmost releasing layer comprised of a fluoropolymer over the second adhesive layer, the fluoropolymer further comprising a monomeric repeat unit that is selected from the group consisting of vinylidene fluoride, hexafluoropropylene, tetrafluoroethylene, perfluoroalkylvinylether, and mixtures thereof.

Assignments (4)
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT RF 064760/0389 Recorded Feb 13, 2024
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: XEROX CORPORATION
Reel/Frame 068261/0001 →
SECURITY INTEREST Recorded Jun 22, 2023
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 064760/0389 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 8, 2011
From: QI, YU
To: XEROX CORPORATION
Reel/Frame 026409/0672 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2008
From: HU, NAN-XING; QI, YU; ZHANG, QI
To: XEROX CORPORATION
Reel/Frame 021295/0189 →
Continuity (1)
Related Publication 20100021748A1 · Jan 28, 2010