Method for manufacturing liquid crystal display device
A liquid crystal display device employs a white sub-pixel among RGBW-4 sub-pixels as a view control component to realize a narrow viewing angle or a wide viewing angle in a fringe field switching mode. The LCD device comprises gate lines and data lines crossing each other to define RGBW sub-pixels on a first substrate, a thin film transistor formed at each crossing of the gate and data lines; a first common electrode in each region of the RGBW sub-pixels, a pixel electrode connected to the thin film transistor and insulated from the first common electrode, the pixel electrode having at least one slit, a second substrate attached to the first substrate, wherein the first and second substrate face each other with a liquid crystal layer interposed therebetween, and a second common electrode on the second substrate and corresponding to each W sub-pixel.
1. A method for manufacturing a liquid crystal display device, comprising:
forming first common electrodes on a first substrate;
forming gate lines and data lines to cross each other to define RGBW sub-pixels on the first substrate;
forming a thin film transistor at each crossing of the gate and data lines;
forming a passivation layer on an overall surface of the first substrate including the thin film transistor;
forming pixel electrodes on the passivation layer, each pixel electrode having at least one slit;
forming black matrices on a second substrate;
forming RGBW color filter layers above the black matrices corresponding to respective RGBW sub-pixels;
forming an overcoat layer on an overall surface of the second substrate including the color filter layers;
the forming the second common electrodes on the overcoat layer to correspond only to each W sub-pixel;
attaching a second substrate to the first substrate, wherein the first and second substrate face each other; and
forming a liquid crystal layer between the first and second substrates.
2. The method according to claim 1 , wherein each W color filter layer is formed at a same time with the forming of the overcoat layer.
3. The method according to claim 2 , wherein the W color filter layer and the overcoat layer are formed of a same material.
4. The method according to claim 1 , wherein the second common electrodes are formed of a transparent conductive layer.
5. The method according to claim 4 , wherein the second common electrodes are formed of either ITO or IZO.
6. The method according to claim 1 , wherein each of the second common electrodes has substantially a same size as that of the W sub-pixel.
7. The method according to claim 1 , further comprising:
forming a second common line connecting the second common electrodes, at the forming of the second common electrodes wherein the second common line extends to a region outside an active region.
8. The method according to claim 7 , further comprising:
arranging the second common line to contact the silver dots formed at corners of a panel to be electrically connected with a driving circuit of the first substrate.
9. The method according to claim 1 , further comprising:
forming a first common line that contacts the first common electrodes at the forming of the gate lines.