Silicone resin and silicone composition
A silicone resin containing boron, aluminum, and/or titanium, and having silicon-bonded branched alkoxy groups; a silicone composition containing a silicone resin; and a method of preparing a coated substrate comprising applying a silicone composition on a substrate to form a film and pyrolyzing the silicone resin of the film.
1. A silicone resin having the formula:
(EO s/2 ) t (HSiO 3/2 ) v ((R 1 O) 3 SiO 1/2 )) w ((R 1 O) 2 SiO 2/2 )) x (R 1 OSiO 3/2 ) y (SiO 4/2 ) z (I),
wherein each E is independently an atom selected from B, Al, and Ti; R 1 is C 1 to C 10 branched alkyl; s=3 when E is B or Al, or s=4 when E is Ti; t is from 0.01 to 0.8; v is from 0 to 0.99; w is from 0 to 0.99; x is from 0 to 0.99; y is from 0 to 0.99; z is from 0 to 0.8; w+x+y=0.01 to 0.99; and t+v+w+x+y+z=1.
2. The silicone resin according to claim 1 , wherein E is boron.
3. The silicone resin according to claim 1 , wherein the silicone resin contains from 20 to 105 mol % of silicon-bonded hydroxy groups.
4. A silicone composition comprising:
(A) a silicone resin having the formula (EO s/2 ) t (HSiO 3/2 ) v ((R 1 O) 3 SiO 1/2 )) w ((R 1 O) 2 SiO 2/2 )) x (R 1 OSiO 3/2 ) y (SiO 4/2 ) z (I), wherein each E is independently an atom selected from B, Al, and Ti; R 1 is C 1 to C 10 branched alkyl; s=3 when E is B or Al, or s=4 when E is Ti; t is from 0.01 to 0.8; v is from 0 to 0.99; w is from 0 to 0.99; x is from 0 to 0.99; y is from 0 to 0.99; z is from 0 to 0.8; w+x+y=0.01 to 0.99; and t+v+w+x+y+z=1; and
(B) an organic solvent.
5. The silicone composition according to claim 4 , wherein E is boron.
6. The silicone composition according to claim 4 , further comprising a hydrogen silsesquioxane resin.
7. A method of preparing a coated substrate, the method comprising:
applying a silicone composition on a substrate to form a film, wherein the silicone composition comprises (A) a silicone resin having the formula (EO s/2 ) t (HSiO 3/2 ) v ((R 1 O) 3 SiO 1/2 )) w ((R 1 O) 2 SiO 2/2 )) x (R 1 OSiO 3/2 ) y (SiO 4/2 ) z (I), wherein each E is independently an atom selected from B, Al, and Ti; R 1 is C 1 to C 10 branched alkyl; s=3 when E is B or Al, or s=4 when E is Ti; t is from 0.01 to 0.8; v is from 0 to 0.99; w is from 0 to 0.99; x is from 0 to 0.99; y is from 0 to 0.99; z is from 0 to 0.8; w+x+y=0.01 to 0.99; and t+v+w+x+y+z=1, and (B) an organic solvent; and
pyrolyzing the silicone resin of the film.
8. The method according to claim 7 , wherein E is boron.
9. The method according to claim 7 , wherein the step of pyrolyzing is carried out in an atmosphere of an inert gas.
10. The method according to claim 7 , wherein the step of pyrolyzing is carried out at a temperature of from 350 to 800° C.