IP Library Granted Patent US 7,989,786
Granted Patent B2
US 7,989,786 · App. 12/166,918 · Granted Aug 2, 2011

Laser-driven light source

Assignee: Energetiq Technology, Inc.
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Quick Facts
Patent No.
US 7,989,786
App. No.
12/166,918
Granted
Aug 2, 2011
Kind
B2
Abstract

An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Claims (50)

1. A light source, comprising:

a chamber;

an energy source for providing energy to a gas within the chamber to produce a plasma that generates a light emitted through the walls of the chamber; and

a reflector that reflects the light emitted through the walls of the chamber, the reflector comprising a reflective surface with a shape configured to compensate for the refractive index of the walls of the chamber.

2. The light source of claim 1 , wherein the energy source is at least one laser external to the chamber.

3. The light source of claim 1 , wherein the energy source is also an ignition source within the chamber.

4. The light source of claim 1 , wherein the energy source is at least one of a microwave energy source, AC arc source, DC arc source, laser or RF energy source.

5. The light source of claim 1 , wherein the chamber is a sealed chamber.

6. The light source of claim 1 , wherein the chamber comprises a cylindrical tube.

7. The light source of claim 6 , wherein the cylindrical tube is tapered.

8. The light source of claim 6 , wherein the chamber comprises one or more seals at one or both ends of the cylindrical tube.

9. The light source of claim 1 , wherein the chamber comprises sapphire, quartz, fused quartz, Suprasil quartz, fused silica, Suprasil fused silica, MgF 2 , diamond, single crystal quartz, or CaF 2 .

10. The light source of claim 1 , wherein the chamber comprises a dielectric material.

11. The light source of claim 1 , wherein the chamber comprises an ultraviolet transparent dielectric material.

12. The light source of claim 1 , wherein the shape comprises a modified parabolic shape, elliptical shape, spherical shape or aspherical shape.

13. The light source of claim 1 , further comprising an ignition source for ionizing a gas within the chamber.

14. The light source of claim 13 , wherein the ignition source comprises electrodes, an ultraviolet ignition source, a capacitive ignition source, an inductive ignition source, a flash lamp, a pulsed laser, or a pulsed lamp.

15. The light source of claim 13 , wherein the ignition source comprises electrodes located on opposite sides of the plasma.

16. The light source of claim 1 , wherein the chamber protrudes through an opening in the reflector.

17. The light source of claim 1 , further comprising a support element that locates the chamber relative to the reflector.

18. The light source of 17 , wherein the support element comprises a fitting to allow at least one of pressure control or filling of the chamber.

19. The light source of claim 1 , further comprising at least one optical element for modifying a property of the high brightness light emitted through the walls of the chamber and reflected by the reflector.

20. The light source of claim 19 , wherein the optical element is a mirror or a lens.

21. The light source of claim 19 , wherein the optical element is configured to deliver the high brightness light emitted through the walls of the chamber and reflected by the reflector to a tool.

22. The light source of claim 21 , wherein the tool comprises a wafer inspection tool, a microscope, an ultraviolet microscope, a reticle inspection system, a metrology tool, a lithography tool, or an endoscopic tool.

23. The light source of claim 2 , wherein the laser is a pulse laser, a continuous-wave fiber laser, or a diode laser.

24. A method for producing light, comprising:

emitting a light through the walls of a chamber; and

using a reflective surface of a reflector to reflect the light, wherein the reflective surface has a shape configured to compensate for the refractive index of the walls of the chamber.

25. The method of claim 24 , comprising flowing gas into the chamber.

26. The method of claim 24 , comprising igniting the gas in the chamber to produce an ionized gas.

27. The method of claim 26 , comprising directing energy to the ionized gas to produce a plasma that generates the light.

28. The method of claim 26 , comprising directing laser energy into the chamber from at least one laser external to the chamber.

29. The method of claim 28 , comprising directing the laser energy through an optical element that modifies a property of the laser energy.

30. The method of claim 24 , comprising directing the reflected light through an optical element to modify a property of the reflected light.

31. The method of claim 30 , comprising directing the reflected light to a tool.

32. The method of claim 23 , comprising controlling the pressure of the chamber.

33. The method of claim 24 , wherein the shape is expressed as a mathematical equation.

34. The method of claim 33 , wherein parameters of the equation are selected to reduce error due to the refractive index of the walls of the chamber below a specified value.

35. The method of claim 24 , wherein the reflective surface has a shape configured to compensate for the refractive index of the walls of the chamber.

36. The method of claim 35 , wherein the reflective surface produces a collimated or focused beam of reflected light.

37. The method of claim 24 wherein the reflective surface has modified parabolic, elliptical, spherical or aspherical shape to compensate for the refractive index of the walls of the chamber producing a focused, reflected high brightness light.

38. A light source, comprising:

a chamber;

an laser source for providing electromagnetic energy to a gas within the chamber to produce a plasma that generates a light emitted through the walls of the chamber; and

a reflector that reflects the electromagnetic energy through the walls of the chamber and the light emitted through the walls of the chamber, the reflector comprising a reflective surface with a shape configured to compensate for the refractive index of the walls of the chamber.

39. A light source, comprising:

a chamber;

a means for providing energy to a gas within the chamber to produce a plasma that generates a light emitted through the walls of the chamber; and

a means for reflecting the light emitted through the walls of the chamber, the reflecting means comprising a reflective surface with a shape configured to compensate for the refractive index of the walls of the chamber.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2019
From: ENERGETIQ TECHNOLOGY, INC.
To: HAMAMATSU PHOTONICS K.K.
Reel/Frame 048380/0084 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 21, 2008
From: SMITH, DONALD K.; HOLBER, WILLIAM M.; CASEY, JEFFREY A.
To: ENERGETIQ TECHNOLOGY INC.
Reel/Frame 021712/0068 →
Continuity (3)
Continuation In Part 11695348 · Apr 2, 2007
Continuation In Part 11395523 · Mar 31, 2006
Related Publication 20090032740A1 · Feb 5, 2009