Optical arrangement of autofocus elements for use with immersion lithography
A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure beam does not pass, of the optical element. A suction is provided to the gap.
1. A lithographic projection apparatus comprising:
an optical element through which a substrate is exposed with an exposure beam, a space between the optical element and the substrate being filled with liquid during the exposure; and
a gap formed between a member and a surface of the optical element through which the exposure beam does not pass,
wherein a suction is provided to the gap.
2. The lithographic projection apparatus of claim 1 , wherein a first surface of the member faces the surface of the optical element through which the exposure beam does not pass, and a second surface of the member faces the substrate.
3. The lithographic projection apparatus of claim 2 , wherein the first surface of the member contacts the liquid in the gap, and the second surface of the member contacts the liquid on the substrate.
4. The lithographic projection apparatus of claim 3 , wherein the second surface of the member is substantially coplanar with a surface of the optical element through which the exposure beam passes.
5. The lithographic projection apparatus of claim 2 , wherein the second surface of the member is substantially coplanar with a surface of the optical element through which the exposure beam passes.
6. The lithographic projection apparatus of claim 2 , wherein the liquid is allowed to fill a space between the substrate and the second surface of the member during exposure of the substrate.
7. The lithographic projection apparatus of claim 1 , wherein the gap is formed between a side surface of the optical element and the member.
8. The lithographic projection apparatus of claim 1 , wherein the gap includes first and second end portions located at opposite ends of the gap, the first end portion disposed adjacent to the substrate, the first end portion located closer to an optical axis of the optical element than the second end portion such that the gap slants away from the optical axis from the first end portion toward the second end portion.
9. The lithographic projection apparatus of claim 1 , wherein the gap slopes away from an optical axis of the optical element as the gap becomes more distant from the substrate.
10. The lithographic projection apparatus of claim 1 , wherein a surface of the substrate is positioned opposite to an end surface of the optical element through which the exposure beam passes, and the liquid covers only a part of the surface of the substrate during the exposure.
11. The lithographic projection apparatus of claim 10 , wherein the liquid is retained between the end surface of the optical element and the substrate, and between a lower surface of the member and the substrate.
12. The lithographic projection apparatus of claim 10 , wherein the member has a lower surface adjacent to the end surface of the optical element, and a portion of the liquid on the substrate is retained between the lower surface of the member and the substrate.
13. The lithographic projection apparatus of claim 1 , wherein a surface of the member that faces the substrate is substantially coplanar with an end surface of the optical element through which the exposure beam passes.
14. A device manufacturing method comprising:
exposing a substrate using the apparatus defined in claim 1 , and
developing the exposed substrate.
15. A lithographic projection method comprising:
providing a substrate so that the substrate faces an optical element and a member disposed adjacent to the optical element;
filling a space between the optical element and the substrate with a liquid through which an exposure beam is directed onto the substrate; and
supplying a suction to a gap between the member and a surface of the optical element through which the exposure beam does not pass.
16. The method of claim 15 , wherein a first surface of the member faces the surface of the optical element through which the exposure beam does not pass, and a second surface of the member faces the substrate.
17. The method of claim 16 , wherein the first surface of the member contacts the liquid in the gap, and the second surface of the member contacts the liquid on the substrate.
18. The method of claim 17 , wherein the second surface of the member is substantially coplanar with a surface of the optical element through which the exposure beam passes.
19. The method of claim 16 , wherein the second surface of the member is substantially coplanar with a surface of the optical element through which the exposure beam passes.
20. The method of claim 16 , wherein the liquid is allowed to fill a space between the substrate and the second surface of the member during exposure of the substrate.
21. The method of claim 15 , wherein the gap is formed between a side surface of the optical element and the member.
22. The method of claim 15 , wherein the gap includes first and second end portions located at opposite ends of the gap, the first end portion disposed adjacent to the substrate, the first end portion located closer to an optical axis of the optical element than the second end portion such that the gap slants away from the optical axis from the first end portion toward the second end portion.
23. The method of claim 15 , wherein the gap slopes away from an optical axis of the optical element as the gap becomes more distant from the substrate.
24. The method of claim 15 , wherein a surface of the substrate is positioned opposite to an end surface of the optical element through which the exposure beam passes, and the liquid covers only a part of the surface of the substrate during the exposure.
25. The method of claim 24 , wherein the liquid is retained between the end surface of the optical element and the substrate, and between a lower surface of the member and the substrate.
26. The method of claim 24 , wherein the member has a lower surface adjacent to the end surface of the optical element, and a portion of the liquid on the substrate is retained between the lower surface of the member and the substrate.
27. The method of claim 15 , wherein a surface of the member that faces the substrate is substantially coplanar with an end surface of the optical element through which the exposure beam passes.
28. A device manufacturing method comprising:
exposing a substrate using the method defined in claim 15 , and
developing the exposed substrate.