Compound semiconductor epitaxial substrate and manufacturing method thereof
A compound semiconductor epitaxial substrate having a pseudomorphic high electron mobility field effect transistor structure including an InGaAs layer as a strained channel layer and an AlGaAs layer containing n type impurities as a front side electron-donating layer, wherein said substrate contains an InGaP layer in an orderly state on the front side of the above described InGaAs layer as the strained channel layer.
1. A compound semiconductor epitaxial substrate having a pseudomorphic high electron mobility field effect transistor structure comprising:
a starting substrate,
an InGaAs layer as a strained channel layer,
an InGaP layer containing n type impurities and not in an orderly state as a front side electron-donating layer, and
an InGaP layer in an orderly state as a gate barrier layer, in this order,
wherein the InGaP front side electron-donating layer is lattice matched to a GaAs layer disposed between the starting substrate and the InGaP front side electron-donating layer,
the orderly state is a state where the band gap value for the InGaP layer is 1.85 eV or less, and
the compositional ratios of the InGaP front side electron-donating layer and the InGaP gate barrier layer are the same.
2. A method of manufacturing a compound semiconductor epitaxial substrate according to claim 1 , comprising epitaxial growth of each layer except for the starting substrate of the compound semiconductor epitaxial substrate using a metal-organic chemical vapor deposition (MOCVD) method.