IP Library › Granted Patent US 8,030,696
Granted Patent B2
US 8,030,696 · App. 12/320,308 · Granted Oct 4, 2011

Thin film transistor substrate, defect repairing method therefor, and display device

Assignee: Sony Corporation
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Quick Facts
Patent No.
US 8,030,696
App. No.
12/320,308
Granted
Oct 4, 2011
Kind
B2
Abstract

A thin film transistor substrate includes: a substrate; a thin film transistor and a capacitor formed on the substrate; and a protective film for protecting an electrode on a back surface side of the capacitor when an electrode on a front surface side of the capacitor is cut by irradiation with laser light, the protective film being disposed at such a position as to enclose a corner part of the electrode on the front surface side between the electrode on the front surface side and the electrode on the back surface side of the capacitor.

Claims (28)

1. A thin film transistor substrate comprising:

a substrate;

a thin film transistor and a capacitor formed on said substrate; and

a protective film for protecting an electrode on a back surface side of said capacitor when laser light is incident on an electrode on a front surface side of said capacitor, the protective film being disposed at such a position as to enclose a corner part of said electrode on the front surface side between said electrode on the front surface side and said electrode on the back surface side of said capacitor,

wherein said protective film has a laminated structure of two layers or more including a layer capable of absorbing laser light.

2. The thin film transistor substrate according to claim 1 , wherein

said thin film transistor is an etch stopper type thin film transistor having a semiconductor layer and an etch stopper layer above a gate electrode, and

said laminated structure comprises a first layer made of a same material as said semiconductor layer, said first layer being the layer capable of absorbing laser light, and a second layer made of a same material as said etch stopper layer.

3. A thin film transistor substrate comprising:

a substrate;

a thin film transistor and a capacitor formed on said substrate; and

a protective film for protecting an electrode on a back surface side of said capacitor when laser light is incident on an electrode on a front surface side of said capacitor, the protective film being disposed at such a position as to enclose a corner part of said electrode on the front surface side between said electrode on the front surface side and said electrode on the back surface side of said capacitor,

wherein said protective film is disposed on an insulating film between said electrode on the front surface side and said electrode on the back surface side, and is covered with said electrode on the front surface side.

4. A display device comprising:

a display element on a thin film transistor substrate, wherein said thin film transistor substrate includes

a substrate,

a thin film transistor and a capacitor formed on said substrate, and

a protective film for protecting an electrode on a back surface side of said capacitor when laser light is incident on an electrode on a front surface side of said capacitor, the protective film being disposed at such a position as to enclose a corner part of said electrode on the front surface side between said electrode on the front surface side and said electrode on the back surface side of said capacitor,

wherein said protective film has a laminated structure of two layers or more including a layer capable of absorbing laser light.

5. The display device according to claim 4 , wherein

said thin film transistor is an etch stopper type thin film transistor having a semiconductor layer and an etch stopper layer above a gate electrode, and

said laminated structure comprises a first layer made of a same material as said semiconductor layer, said first layer being the layer capable of absorbing laser light, and a second layer made of a same material as said etch stopper layer.

6. A display device comprising:

a display element on a thin film transistor substrate, wherein said thin film transistor substrate includes

a substrate;

a thin film transistor and a capacitor formed on said substrate; and

a protective film for protecting an electrode on a back surface side of said capacitor when laser light is incident on an electrode on a front surface side of said capacitor, the protective film being disposed at such a position as to enclose a corner part of said electrode on the front surface side between said electrode on the front surface side and said electrode on the back surface side of said capacitor,

wherein said protective film is disposed on an insulating film between said electrode on the front surface side and said electrode on the back surface side, and is covered with said electrode on the front surface side.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2009
From: ISHIHAMA, YASUYUKI
To: SONY CORPORATION
Reel/Frame 022196/0115 →
Priority Claims (1)
JP 2008-028089 · Feb 7, 2008 · national
Continuity (1)
Related Publication 20090200555A1 · Aug 13, 2009