IP Library Granted Patent US 8,034,182
Granted Patent B2
US 8,034,182 · App. 10/826,920 · Granted Oct 11, 2011

Apparatus for forming a film and an electroluminescence device

Assignee: Semiconductor Energy Laboratory Co., Ltd.
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Quick Facts
Patent No.
US 8,034,182
App. No.
10/826,920
Granted
Oct 11, 2011
Kind
B2
Abstract

A device having three evaporation sources and a unit for moving the respective evaporation sources in one chamber is used, whereby it becomes possible to increase efficiency of use of an evaporation material. Consequently, manufacturing cost can be reduced, and a uniform thickness can be obtained over an entire surface of a substrate even in the case in which a large area substrate is used.

Claims (69)

1. An apparatus for forming a film comprising:

a load chamber;

a conveyance chamber connected to the load chamber;

a film formation chamber connected to the conveyance chamber; and

an installation chamber connected to the film formation chamber, and comprising means adapted to move a first evaporation source, means adapted to move a second evaporation source, and means adapted to move a third evaporation source,

wherein at least one of the first, second and third evaporation sources includes a first container and a second container,

wherein each of the first container and the second container comprises a guide portion having an opening,

wherein an inclination of the first container is the same as an inclination of the second container,

wherein an inclination of the guide portion of the first container is different from an inclination of the guide portion of the second container, such that a direction of the opening of the first container is different from that of the second container, and

wherein each of the means adapted to move the first, second, and third evaporation sources is configured to move in an X direction, a Y direction, and a Z direction in the film formation chamber.

2. The apparatus for forming the film according to claim 1 ,

wherein the installation chamber is connected to evacuating and exhausting means that evacuates the installation chamber.

3. The apparatus for forming the film according to claim 1 ,

wherein the film formation chamber is connected to an evacuation and exhaust treatment chamber that evacuates the film forming chamber and has means for introducing at least one of a material gas and a cleaning gas.

4. The apparatus for forming the film according to claim 1 , wherein the film formation chamber has a shutter that sections the film formation chamber and shields evaporation to the substrate.

5. The apparatus for forming the film according to claim 1 ,

wherein a sealing chamber is connected to the conveyance chamber, and

wherein the sealing chamber is connected to evacuating and exhausting means, which evacuates the sealing chamber, and has a mechanism for applying a seal material with an ink jet method in the sealing chamber.

6. The apparatus for forming the film according to claim 1 , wherein the installation chamber further comprises a first installation chamber, a second installation chamber, and a third installation chamber, and wherein the means adapted to move the first evaporation source is provided in the first installation chamber, the means adapted to move the second evaporation source is provided in the second installation chamber, and the means adapted to move the third evaporation source is provided in the third installation chamber.

7. The apparatus for forming the film according to claim 1 , wherein the installation chamber comprises a single installation chamber, and wherein the means adapted to move the first evaporation source, the means adapted to move the second evaporation source, and the means adapted to move the third evaporation source are provided in the single installation chamber.

8. The apparatus for forming the film according to claim 1 ,

wherein an evaporation is performed while at least one of the means adapted to move the first, second, and third evaporation sources moves in the film formation chamber.

9. An apparatus for forming a film comprising:

a load chamber;

a conveyance chamber connected to the load chamber;

a film formation chamber connected to the conveyance chamber; and

an installation chamber connected to the film formation chamber, and comprising means adapted to move a first evaporation source, means adapted to move a second evaporation source, and means adapted to move a third evaporation source,

wherein at least one of the first, second and third evaporation sources includes a first container and a second container,

wherein each of the first container and the second container comprises a guide portion having an opening,

wherein an inclination of the first container is the same as an inclination of the second container,

wherein an inclination of the guide portion of the first container is different from an inclination of the guide portion of the second container, such that a direction of the opening of the first container is different from that of the second container,

wherein the film formation chamber comprises an aligning means that aligns a mask and a substrate, and

wherein each of the means adapted to move the first, second, and third evaporation sources is configured to move in an X direction, a Y direction, and a Z direction in the film formation chamber.

10. The apparatus for forming the film according to claim 9 ,

wherein the installation chamber is connected to evacuating and exhausting means that evacuates the installation chamber.

11. The apparatus for forming the film according to claim 9 ,

wherein the film formation chamber is connected to an evacuation and exhaust treatment chamber that evacuates the film forming chamber and has means for introducing at least one of a material gas and a cleaning gas.

12. The apparatus for forming the film according to claim 9 ,

wherein the film formation chamber has a shutter that sections the film formation chamber and shields evaporation to the substrate.

13. The apparatus for forming the film according to claim 9 ,

wherein a sealing chamber is connected to the conveyance chamber, and

wherein the sealing chamber is connected to evacuating and exhausting means, which evacuates the sealing chamber, and has a mechanism for applying a seal material with an ink jet method in the sealing chamber.

14. The apparatus for forming the film according to claim 9 , wherein the installation chamber further comprises a first installation chamber, a second installation chamber, and a third installation chamber, and wherein the means adapted to move the first evaporation source is provided in the first installation chamber, the means adapted to move the second evaporation source is provided in the second installation chamber, and the means adapted to move the third evaporation source is provided in the third installation chamber.

15. The apparatus for forming the film according to claim 9 , wherein the installation chamber comprises a single installation chamber, and wherein the means adapted to move the first evaporation source, the means adapted to move the second evaporation source, and the means adapted to move the third evaporation source are provided in the single installation chamber.

16. The apparatus for forming the film according to claim 9 ,

wherein an evaporation is performed while at least one of the means adapted to move the first, second, and third evaporation sources moves in the film formation chamber.

17. An apparatus for forming a film comprising:

a load chamber;

a conveyance chamber connected to the load chamber;

a film formation chamber connected to the conveyance chamber; and

an installation chamber connected to the film formation chamber, and comprising means adapted to move a first evaporation source, means adapted to move a second evaporation source, and means adapted to move a third evaporation source,

wherein at least one of the first, second and third evaporation sources includes a first container and a second container,

wherein each of the first container and the second container comprises a guide portion having an elliptical opening,

wherein an inclination of the first container is the same as an inclination of the second container,

wherein an inclination of the guide portion of the first container is different from an inclination of the guide portion of the second container, such that a direction of the elliptical opening of the first container is different from that of the second container, and

wherein each of the means adapted to move the first, second, and third evaporation sources is configured to move in an X direction, a Y direction, and a Z direction in the film formation chamber.

18. The apparatus for forming the film according to claim 17 ,

wherein the installation chamber is connected to evacuating and exhausting means that evacuates the installation chamber.

19. The apparatus for forming the film according to claim 17 ,

wherein the film formation chamber is connected to an evacuation and exhaust treatment chamber that evacuates the film forming chamber and has means for introducing at least one of a material gas and a cleaning gas.

20. The apparatus for forming the film according to claim 17 ,

wherein the film formation chamber has a shutter that sections the film formation chamber and shields evaporation to the substrate.

21. The apparatus for forming the film according to claim 17 ,

wherein a sealing chamber is connected to the conveyance chamber, and

wherein the sealing chamber is connected to evacuating and exhausting means, which evacuates the sealing chamber, and has a mechanism for applying a seal material with an ink jet method in the sealing chamber.

22. The apparatus for forming the film according to claim 17 , wherein the installation chamber further comprises a first installation chamber, a second installation chamber, and a third installation chamber, and wherein the means adapted to move the first evaporation source is provided in the first installation chamber, the means adapted to move the second evaporation source is provided in the second installation chamber, and the means adapted to move the third evaporation source is provided in the third installation chamber.

23. The apparatus for forming the film according to claim 17 , wherein the installation chamber comprises a single installation chamber, and wherein the means adapted to move the first evaporation source, the means adapted to move the second evaporation source, and the means adapted to move the third evaporation source are provided in the single installation chamber.

24. The apparatus for forming the film according to claim 17 ,

wherein an evaporation is performed while at least one of the means adapted to move the first, second, and third evaporation sources moves in the film formation chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 19, 2004
From: YAMAZAKI, SHUNPEI; KUWABARA, HIDEAKI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 015230/0064 →
Priority Claims (1)
JP 2003-121313 · Apr 25, 2003 · national
Continuity (1)
Related Publication 20050005848A1 · Jan 13, 2005