IP Library › Granted Patent US 8,039,925
Granted Patent B2
US 8,039,925 · App. 11/140,005 · Granted Oct 18, 2011

Integrated radio frequency circuits

Assignee: Altera Corporation
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Quick Facts
Patent No.
US 8,039,925
App. No.
11/140,005
Granted
Oct 18, 2011
Kind
B2
Abstract

A plurality of devices, such as devices that are utilized for implementing radio frequency applications, can be formed in the same substrate. Each of these devices may be formed over a triple well that includes at least one well capable of being biased. Each of the wells is coupled to a well bias through a resistor. In some embodiments, a plurality of wells operating at a relatively high frequency may be connected to the same bias potential, each through separate resistors. The noise coupling may be reduced through the use of the bias resistors.

Claims (13)

1. An integrated circuit comprising:

a substrate;

a first circuit element formed over said substrate;

a first triple well formed in said substrate, said first circuit element in communication with first drain and source regions within the first triple well;

a first resistor directly connected to a P-well of said first triple well, wherein a bias potential is applied through the first resistor to the P well, wherein the first bias potential has a value greater than V ss ;

a second circuit element formed over said substrate;

a second triple well formed in said substrate, said second circuit element in communication with second drain and source regions within the second triple well; and

a second resistor directly connected to a first well of said second triple well, wherein a second bias potential is applied through the second resistor to the first well of said second triple well.

2. The circuit of claim 1 wherein said first circuit element is a complementary metal oxide semiconductor transistor.

3. The integrated circuit of claim 1 wherein the first circuit element and the second circuit element are transistors.

4. The integrated circuit of claim 1 , wherein the second bias potential is greater than a ground potential.

5. The integrated circuit of claim 4 wherein the P-well of said first triple well is formed in an N-well.

6. The integrated circuit of claim 4 wherein the first well of said second triple well is an N-well formed in the substrate and wherein the first circuit element and the second circuit element are transistors.

Continuity (6)
Division 10081111 · Feb 21, 2002
Continuation In Part 09948271 · Sep 6, 2001
Continuation In Part 09792848 · Feb 23, 2001
Continuation In Part 09596486 · Jun 19, 2000
Continuation In Part 09580713 · May 3, 2000
Related Publication 20050221787A1 · Oct 6, 2005