One-step synthesis and patterning of aligned polymer nanowires on a substrate
In a method of making a polymer structure on a substrate a layer of a first polymer, having a horizontal top surface, is applied to a surface of the substrate. An area of the top surface of the polymer is manipulated to create an uneven feature that is plasma etched to remove a first portion from the layer of the first polymer thereby leaving the polymer structure extending therefrom. A light emitting structure includes a conductive substrate from which an elongated nanostructure of a first polymer extends. A second polymer coating is disposed about the nanostructure and includes a second polymer, which includes a material such that a band gap exists between the second polymer coating and the elongated nanostructure. A conductive material coats the second polymer coating. The light emitting structure emits light when a voltage is applied between the conductive substrate and the conductive coating.
1. A method of making a polymer structure on a substrate, the method comprising the actions of:
a. applying a layer of a first polymer, having a horizontal top surface, to a surface of the substrate;
b. manipulating an area of the top surface of the first polymer so at to create a surface portion that is non-parallel to the horizontal top surface;
c. plasma etching the surface portion that is non-parallel to the horizontal top surface so as to remove a first portion from the layer of the first polymer thereby leaving the first polymer structure extending from the layer of the first polymer.
2. The method of claim 1 , wherein the plasma etching action comprises:
a. placing the area of the top surface of the first polymer in an inductively coupled plasma reactive ion milling chamber; and
b. introducing a chemical etchant gas into the inductively coupled plasma reactive ion milling chamber for a predetermined amount of time.
3. The method of claim 1 , wherein applying action comprises the action of spin coating the first polymer onto the substrate.
4. The method of claim 1 , wherein applying action comprises the action of applying a tape including the first polymer to the substrate.
5. The method of claim 1 , wherein substrate comprises a material selected from a group consisting of: a crystalline substance, an amorphous substance, a fibrous material and combinations thereof.
6. The method of claim 1 , wherein the action of manipulating an area of the top surface of the first polymer comprises the action of impressing an object onto the top surface of the first polymer.
7. The method of claim 1 , wherein the action of manipulating an area of the top surface of the first polymer comprises scratching the top surface of the first polymer.
8. The method of claim 1 , wherein the first polymer comprises a polymer selected from a group consisting of: PEDOT:PSS, PPY, SU8, PVDF, PMMA, PS, MEH-PPV, and combinations thereof.
9. The method of claim 1 , wherein the substrate comprises a conductive substrate and wherein the first polymer structure comprises an elongated nanostructure, the method further comprising the actions of:
a. coating the elongated nanostructure with a coating of a second polymer, the second polymer including a material such that a band gap exists between the second polymer and the elongated nanostructure; and
b. coating the second polymer with a conductive coating, wherein light is emitted when a voltage is applied between the conductive substrate and the conductive coating.
10. The method of claim 9 , wherein the substrate comprises an ITO glass.
11. The method of claim 9 , wherein the substrate comprises a flexible material.
12. The method of claim 9 , wherein the first polymer comprises PEDOT:PSS.
13. The method of claim 9 , wherein the second polymer comprises MEH-PPV.
14. The method of claim 9 , wherein the conductive coating comprises a metal.