Display device and manufacturing method thereof
View Patent ↗It is an object of the present invention to provide a display device that has a structure of an electrode where a residue of a transparent conductive film is not generated when a weak acid solution is used in etching, which is particularly appropriate for an electrode of a light-emitting element. A display device according to the present invention has an electrode that has a laminated structure of laminated transparent conductive films, and the electrode has a first transparent conductive film as the bottom layer, where no residue is generated when a weak acid solution is used in etching, and a second transparent conductive film as the top layer, which has a work function of 5.0 eV or more.
1. A method of manufacturing a display device, comprising:
forming a first transparent conductive film comprising one selected from the group consisting of indium tin oxide containing one or both of silicon oxide and silicon, zinc oxide and zinc oxide containing gallium;
forming a second transparent conductive film comprising one selected from the group consisting of indium tin oxide and tin oxide over the first transparent conductive film so as to have a laminate structure of the first transparent conductive film and the second transparent conductive film; and
patterning the first transparent conductive film and the second transparent conductive film by using a weak acid solution after forming the second transparent conductive film over the first transparent conductive film.
2. The method according to claim 1 , wherein the second transparent conductive film has a surface polished between the step of forming the second transparent conductive film and the step of patterning the first transparent conductive film and the second transparent conductive film.
3. The method according to claim 1 , wherein the first transparent conductive film is an amorphous transparent conductive film.
4. The method according to claim 1 , further comprising forming a light-emitting layer over the second transparent conductive film; and
forming a film without translucency over the light-emitting layer.
5. The method according to claim 1 , wherein the second transparent conductive film has a work function of 5.0 eV or more.
6. The method according to claim 1 , wherein the first transparent conductive film has a film thickness of 80 to 120 nm, and the second transparent conductive film has a film thickness of 5 to 30 nm.
7. The method according to claim 1 , wherein the display device is applied in an electronic device selected from the group consisting of a video camera, a laptop personal computer, a personal digital assistant, a digital camera and a mobile phone.
8. A method of manufacturing a display device, comprising:
forming a first transparent conductive film comprising one selected from the group consisting of indium tin oxide containing one or both of silicon oxide and silicon, zinc oxide and zinc oxide containing gallium;
forming a second transparent conductive film comprising one selected from the group consisting of indium tin oxide and tin oxide over the first transparent conductive film so as to have a laminate structure of the first transparent conductive film and the second transparent conductive film;
patterning the first transparent conductive film and the second transparent conductive film by using a weak acid solution after forming the second transparent conductive film over the first transparent conductive film; and
performing heat treatment to crystallize the second transparent conductive film after patterning the first transparent conductive film and the second transparent conductive film.
9. The method according to claim 8 , wherein the second transparent conductive film has a surface polished between the step of forming the second transparent conductive film and the step of patterning the first transparent conductive film and the second transparent conductive film.
10. The method according to claim 8 , wherein a strong acid solution is used to subject the second transparent conductive film to surface treatment after crystallizing the second transparent conductive film.
11. The method according to claim 8 , wherein the first transparent conductive film is an amorphous transparent conductive film.
12. The method according to claim 8 , further comprising forming a light-emitting layer over the second transparent conductive film; and
forming a film without translucency over the light-emitting layer.
13. The method according to claim 8 , wherein the second transparent conductive film has a work function of 5.0 eV or more.
14. The method according to claim 8 , wherein the first transparent conductive film has a film thickness of 80 to 120 nm, and the second transparent conductive film has a film thickness of 5 to 30 nm.
15. The method according to claim 8 , wherein the display device is applied in an electronic device selected from the group consisting of a video camera, a laptop personal computer, a personal digital assistant, a digital camera and a mobile phone.
16. A method of manufacturing a display device, comprising:
forming a first transparent conductive film comprising one selected from the group consisting of indium tin oxide containing one or both of silicon oxide and silicon, zinc oxide and zinc oxide containing gallium;
forming a second transparent conductive film comprising one selected from the group consisting of indium tin oxide and tin oxide over the first transparent conductive film so as to have a laminate structure of the first transparent conductive film and the second transparent conductive film;
patterning the first transparent conductive film and the second transparent conductive film by using a weak acid solution after forming the second transparent conductive film over the first transparent conductive film;
performing heat treatment to crystallize the second transparent conductive film after patterning the first transparent conductive film and the second transparent conductive film; and
subjecting the second transparent conductive film to surface treatment after performing the heat treatment.
17. The method according to claim 16 , wherein the second transparent conductive film has a surface polished between the step of forming the second transparent conductive film and the step of patterning the first transparent conductive film and the second transparent conductive film.
18. The method according to claim 16 , wherein a strong acid solution is used to subject the second transparent conductive film to surface treatment after crystallizing the second transparent conductive film.
19. The method according to claim 16 , wherein oxygen plasma or alkali solution is used for the surface treatment.
20. The method according to claim 16 , wherein the first transparent conductive film is an amorphous transparent conductive film.
21. The method according to claim 16 , further comprising forming a light-emitting layer over the second transparent conductive film.
22. The method according to claim 16 , wherein the second transparent conductive film has a work function of 5.0 eV or more.
23. The method according to claim 16 , wherein the first transparent conductive film has a film thickness of 80 to 120 nm, and the second transparent conductive film has a film thickness of 5 to 30 nm.
24. The method according to claim 16 , wherein the display device is applied in an electronic device selected from the group consisting of a video camera, a laptop personal computer, a personal digital assistant, a digital camera and a mobile phone.
25. A method of manufacturing a display device, comprising:
forming a first transparent conductive film;
forming a second transparent conductive film over the first transparent conductive film so as to have a laminate structure of the first transparent conductive film and the second transparent conductive film; and
patterning the first transparent conductive film and the second transparent conductive film by using a weak acid solution after forming the second transparent conductive film over the first transparent conductive film,
wherein crystallinity of the second transparent conductive film is higher than that of the first transparent conductive film.
26. The method according to claim 25 , further comprising a step of polishing a surface of the second transparent conductive film.
27. The method according to claim 25 , wherein the first transparent conductive film is an amorphous transparent conductive film.
28. The method according to claim 25 , further comprising forming a light-emitting layer over the second transparent conductive film; and
forming a film without translucency over the light-emitting layer.
29. The method according to claim 25 , wherein the second transparent conductive film has a work function of 5.0 eV or more.
30. The method according to claim 25 , wherein the first transparent conductive film has a film thickness of 80 to 120 nm, and the second transparent conductive film has a film thickness of 5 to 30 nm.
31. The method according to claim 25 , wherein the display device is applied in an electronic device selected from the group consisting of a video camera, a laptop personal computer, a personal digital assistant, a digital camera and a mobile phone.
32. A method of manufacturing a display device, comprising:
forming a first transparent conductive film;
forming a second transparent conductive film over the first transparent conductive film so as to have a laminate structure of the first transparent conductive film and the second transparent conductive film;
patterning the first transparent conductive film and the second transparent conductive film by using a weak acid solution after forming the second transparent conductive film over the first transparent conductive film; and
performing heat treatment to crystallize the second transparent conductive film after forming the second transparent conductive film over the first transparent conductive film,
wherein crystallinity of the second transparent conductive film is higher than that of the first transparent conductive film.
33. The method according to claim 32 , further comprising a step of polishing a surface of the second transparent conductive film.
34. The method according to claim 32 , wherein a strong acid solution is used to subject the second transparent conductive film to surface treatment after crystallizing the second transparent conductive film.
35. The method according to claim 32 , wherein the first transparent conductive film is an amorphous transparent conductive film.
36. The method according to claim 32 , further comprising forming a light-emitting layer over the second transparent conductive film; and
forming a film without translucency over the light-emitting layer.
37. The method according to claim 32 , wherein the second transparent conductive film has a work function of 5.0 eV or more.
38. The method according to claim 32 , wherein the first transparent conductive film has a film thickness of 80 to 120 nm, and the second transparent conductive film has a film thickness of 5 to 30 nm.
39. The method according to claim 32 , wherein the display device is applied in an electronic device selected from the group consisting of a video camera, a laptop personal computer, a personal digital assistant, a digital camera and a mobile phone.
40. A method of manufacturing a display device, comprising:
forming a first transparent conductive film;
forming a second transparent conductive film over the first transparent conductive film so as to have a laminate structure of the first transparent conductive film and the second transparent conductive film;
performing heat treatment to crystallize the second transparent conductive film after forming the second transparent conductive film over the first transparent conductive film; and
subjecting the second transparent conductive film to surface treatment after performing the heat treatment,
wherein crystallinity of the second transparent conductive film is higher than that of the first transparent conductive film.
41. The method according to claim 40 , further comprising a step of polishing a surface of the second transparent conductive film.
42. The method according to claim 40 , wherein a strong acid solution is used to subject the second transparent conductive film to surface treatment after crystallizing the second transparent conductive film.
43. The method according to claim 40 , wherein oxygen plasma or alkali solution is used for the surface treatment.
44. The method according to claim 40 , wherein the first transparent conductive film is an amorphous transparent conductive film.
45. The method according to claim 40 , further comprising forming a light-emitting layer over the second transparent conductive film.
46. The method according to claim 40 , wherein the second transparent conductive film has a work function of 5.0 eV or more.
47. The method according to claim 40 , wherein the first transparent conductive film has a film thickness of 80 to 120 nm, and the second transparent conductive film has a film thickness of 5 to 30 nm.
48. The method according to claim 40 , wherein the display device is applied in an electronic device selected from the group consisting of a video camera, a laptop personal computer, a personal digital assistant, a digital camera and a mobile phone.