IP Library Granted Patent US 8,059,458
Granted Patent B2
US 8,059,458 · App. 12/006,227 · Granted Nov 15, 2011

3T high density nvDRAM cell

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Quick Facts
Patent No.
US 8,059,458
App. No.
12/006,227
Granted
Nov 15, 2011
Kind
B2
Abstract

A memory circuit includes a single transistor storing both volatile and nonvolatile bit charges.

Claims (45)

1. A memory circuit comprising:

a single transistor storing both volatile and nonvolatile bit charges;

wherein the volatile bit charge storage is accomplished via gate-to-bulk capacitances and source-to-drain capacitances of the single transistor.

2. The memory circuit of claim 1 , wherein the single transistor storing both volatile and nonvolatile bit charges further comprises:

a SONOS transistor.

3. The memory circuit of claim 1 , wherein the single transistor storing both volatile and nonvolatile bit charges further comprises:

a Floating-Gate transistor.

4. The memory circuit of claim 1 , further comprising:

first and second isolation transistors.

5. The memory circuit of claim 4 , wherein the first and second isolation transistors further comprise:

transistors having different gate-oxide thicknesses.

6. The memory circuit of claim 1 , further comprising:

a sensing circuit responsive to voltage differentials for volatile operations, and responsive to current flow for at least one nonvolatile operation.

7. The memory circuit of claim 1 , further comprising:

a bit cell comprising a pair of charge cells each storing both volatile and nonvolatile bit charges.

8. The memory circuit of claim 7 , wherein a single transistor of each charge cell storing both volatile and nonvolatile bit charges further comprises:

a SONOS transistor of each charge cell.

9. The memory circuit of claim 7 , further comprising:

a first charge cell of the pair storing both volatile and nonvolatile bit values, and a second charge cell of the pair storing complements of the volatile and nonvolatile bit values.

10. The memory circuit of claim 9 , further comprising:

the first charge cell coupled to a bit line and the second charge cell coupled to a complement bit line.

11. The memory circuit of claim 7 , wherein each charge cell further comprises:

first and second isolation transistors having different gate-oxide thicknesses.

12. A method of operating a combined volatile and nonvolatile memory circuit, comprising:

causing a first charge representing a nonvolatile bit to be stored in a charge trapping region of a transistor, and causing a second charge representing a volatile bit to be stored via gate-to-bulk capacitances and source-to-drain capacitances of the transistor.

13. The method of claim 12 , further comprising:

detecting the second charge as a voltage disturbance to bit line precharge levels that are approximately halfway between zero and one.

14. The method of claim 12 , further comprising:

detecting the first charge via a current flow enabled when the first charge is present and absent otherwise.

15. The method of claim 12 , further comprising:

refreshing the second charge from a bit line after a memory operation that affects the first charge.

16. The method of claim 15 , further comprising:

refreshing the second charge from the bit line after a volatile memory READ operation that affects the first charge.

17. The method of claim 15 , further comprising:

refreshing the second charge from the bit line after a nonvolatile memory ERASE operation that destroys the first charge.

18. The method of claim 15 , further comprising:

refreshing the second charge from the bit line after a nonvolatile memory STORE operation that affects the first charge.

19. A device comprising:

a processor coupled to interact with a memory system, the memory system comprising:

an array of memory cells each storing a single volatile bit and a single nonvolatile bit, each cell employing a single transistor to store the volatile bit and to store the nonvolatile bit;

wherein the volatile bit charge storage is accomplished via gate-to-bulk capacitances and source-to-drain capacitances of the single transistor.

20. The device of claim 19 , further comprising:

the single transistor a SONOS transistor.

21. The device of claim 19 , further comprising:

each cell employing a single transistor to store a complement of the volatile bit and to store a complement of the nonvolatile bit.

Assignments (6)
CORRECTIVE ASSIGNMENT TO CORRECT THE 8647899 PREVIOUSLY RECORDED ON REEL 035240 FRAME 0429. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTERST. Recorded Nov 3, 2020
From: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 058002/0470 →
RELEASE OF SECURITY INTEREST Recorded Dec 22, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
Reel/Frame 041178/0061 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2016
From: CYPRESS SEMICONDUCTOR CORPORATION
To: MONTEREY RESEARCH, LLC
Reel/Frame 040908/0979 →
SECURITY INTEREST Recorded Mar 21, 2015
From: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 035240/0429 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 31, 2008
From: SIMTEK CORPORATION
To: CYPRESS SEMICONDUCTOR CORPORATION
Reel/Frame 021771/0821 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 29, 2008
From: SCADE, ANDREAS; GUENTHER, STEFAN
To: SIMTEK
Reel/Frame 020875/0020 →