IP Library Granted Patent US 8,070,145
Granted Patent B2
US 8,070,145 · App. 11/509,648 · Granted Dec 6, 2011

Holding unit, assembly system, sputtering unit, and processing method and processing unit

Assignee: Nikon Corporation
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Quick Facts
Patent No.
US 8,070,145
App. No.
11/509,648
Granted
Dec 6, 2011
Kind
B2
Abstract

Because an electromagnetic chuck supplies current to a specific microcoil among a plurality of microcoils and makes an object exert an electromagnetic force working together with a magnet of the object, the object can be held in a state where the object is set at a desired position (a position that corresponds to the microcoil to which current has been supplied) on a base surface. Further, by gas that blows out from a gas supply passage, a levitation force is given to the object, which can reduce effects of a friction force that acts between the object and an upper surface of the electromagnetic chuck when the position of the object is set.

Claims (22)

1. A holding unit that holds an object that contains a magnetic substance at least partially, the holding unit comprising:

a base;

a plurality of microcoils arranged in the base that works with the magnetic substance to make the object exert an electromagnetic force;

a control unit that connects to the plurality of microcoils and performs switching between supplying current to each of the microcoils and stopping the supply of current; and

a levitation force mechanism that gives levitation force with respect to the base, to the object, wherein

the levitation force is a force to restrain or prevent a surface force acting on the object when the object is mounted on the base from becoming larger than a volume force,

the control unit is configured to control the levitation force mechanism based on the surface force acting on the object, and

the base includes a wiring board on an upper surface of which the plurality of microcoils are disposed, and an insulation member arranged in a gap between the plurality of microcoils on the wiring board.

2. The holding unit of claim 1 wherein

the levitation force mechanism gives levitation force to the object by using gas.

3. The holding unit of claim 2 wherein

the levitation force mechanism has a gas supply passage, which is formed in the base.

4. The holding unit of claim 1 wherein

the levitation force mechanism gives levitation force to the object by using magnetic force.

5. The holding unit of claim 1 wherein

the microcoil is manufactured using at least a part of a semiconductor process that manufactures a fine microcoil.

6. The holding unit of claim 1 wherein

the base has a portion made of silicon.

7. The holding unit of claim 1 , further comprising:

a movement unit that moves the base.

8. The holding unit of claim 1 , wherein

the base has a coil holding board that includes the wiring board and the insulation member and that has an upper surface serving as an upper surface of the base.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEES ADDRESS. DOCUMENT PREVIOUSLY RECORDED AT REEL 018482 FRAME 0702. Recorded Jan 10, 2007
From: SHIBAZAKI, YUICHI
To: NIKON CORPORATION
Reel/Frame 018759/0777 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 3, 2006
From: SHIBAZAKI, YUICHI
To: NIKON CORPORATION
Reel/Frame 018482/0702 →
Priority Claims (1)
JP 2005-245439 · Aug 26, 2005 · national
Continuity (2)
Provisional Application 60727829 · Oct 19, 2005
Related Publication 20070046913A1 · Mar 1, 2007