Air sterilization apparatus
An air sterilization apparatus for sterilizing air that can include a fan assembly, which may be mounted in an upper-part of a room, and a UVC lamp to emit a UVGI field. The air sterilization apparatus may direct air across the UVGI field to sterilize the air. A baffle may also be provided to shield the eyes of occupants of the room from UVC energy contained in the UVGI field. The air sterilization apparatus may also include an illuminator lamp to provide illumination to a room.
1. A method for sterilizing air, comprising the steps of:
providing an air sterilization apparatus including a baffle, a UVC lamp, and a fan assembly having an inlet and outlet in an upper-part of a room to circulate air;
emitting a UVGI field proximate to the outlet of the fan assembly; and
drawing the air into the fan assembly through the inlet in a first direction and directing the air out through the outlet in a second direction across the UVGI field,
wherein a bottom surface of the UVC lamp is located substantially flush with or above the upper-most surface of the baffle such that horizontal radiation emissions from the UVC lamp are unimpeded by the baffle.
2. The method of claim 1 , further comprising:
supporting the fan from the ceiling.
3. The method of claim 1 , wherein the first direction is a substantially vertical direction and the second direction is a substantially horizontal direction.
4. The method of claim 1 , wherein the air is directed across the upper-part of the room and through the UVGI field.
5. The method of claim 1 , wherein the fan assembly pulls air from the lower-part of the room to the upper-part of the room in a substantially vertical direction.
6. The method of claim 1 , wherein the air is directed out of the outlet over 360°.
7. The method of claim 1 , wherein the air is directed out of the outlet without the use of louvers.
8. The method of claim 1 , wherein the air is directed out of the outlet, through the UVGI field, and across the upper-part of the room without the use of louvers.
9. The method of claim 1 , wherein the baffle is arranged to limit the UVGI field emission below the baffle.