Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin
A resin to be added to a resist composition and locally distributed on a resist film surface to hydrophobitize the resist film surface includes a residual monomer in an amount of 1 mass % or less to the resin as a whole in terms of solid content.
1. A resin to be added to a resist composition and locally distributed on a resist film surface to hydrophobitize the resist film surface, the resin comprising: a residual monomer in an amount of 1 mass % or less to the resin as a whole in terms of solid content, said resin being manufactured by a method comprising passing a solution containing a resin obtained by polymerization through a filter comprising a porous polyolefin film having a cation exchange group.
2. A method for manufacturing the resin as claimed in claim 1 , the method comprising:
passing a solution containing a resin obtained by polymerization through a filter comprising a porous polyolefin film having a cation exchange group.
3. A method for manufacturing the resin claimed in claim 1 , the method comprising:
passing a solution containing a resin obtained by polymerization through a filter having positive ζ-potential.
4. The method as claimed in claim 2 , wherein
the purity of a monomer for use in the synthesis of the resin is 99% or more.
5. The method as claimed in claim 3 , wherein the purity of a monomer for use in the synthesis of the resin is 99% or more.
6. The method as claimed in claim 2 , further comprising:
removing a radical capturing material, before the polymerization, from at least one of (a) a solution containing a monomer, a radical polymerization initiator, and a solvent, and (b) a solvent in the reaction vessel.
7. The method as claimed in claim 3 , further comprising:
removing a radical capturing material, before the polymerization, from at least one of (a) a solution containing a monomer, a radical polymerization initiator, and a solvent, and (b) a solvent in the reaction vessel.
8. The method as claimed in claim 2 , further comprising:
bringing the resin obtained by polymerization into contact with an aqueous solution.
9. The method as claimed in claim 3 , further comprising:
bringing the resin obtained by polymerization into contact with an aqueous solution.
10. The method as claimed in claim 2 , further comprising:
performing, after precipitation-purifying the resin obtained by polymerization, at least either treatment of (i) a repulping treatment using a poor solvent, or (ii) a rinsing treatment using a poor solvent.
11. The method as claimed in claim 3 , further comprising:
performing, after precipitation-purifying the resin obtained by polymerization, at least either treatment of (i) a repulping treatment using a poor solvent, or (ii) a rinsing treatment using a poor solvent.
12. A positive resist composition comprising:
(A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, and capable of increasing the solubility in an alkali developing solution by the action of an acid,
(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation,
(C) the resin as claimed in claim 1 , and
(D) a solvent.
13. A pattern-forming method comprising:
forming a resist film with the positive resist composition as claimed in claim 12 ,
exposing the resist film, and
developing the resist film.
14. The resin as claimed in claim 1 , wherein the purity of a monomer for use in the synthesis of the resin is 99% or more.
15. The resin as claimed in claim 1 , wherein the method of manufacturing the resin further comprises:
removing a radical capturing material, before the polymerization, from at least one of (a) a solution containing a monomer, a radical polymerization initiator, and a solvent, and (b) a solvent in the reaction vessel.
16. The resin as claimed in claim 1 , wherein the method of manufacturing the resin further comprises:
bringing the resin obtained by polymerization into contact with an aqueous solution.
17. The resin as claimed in claim 1 , wherein the method of manufacturing the resin further comprises:
performing, after precipitation-purifying the resin obtained by polymerization, at least either treatment of (i) a repulping treatment using a poor solvent, or (ii) a rinsing treatment using a poor solvent.
18. A resin to be added to a resist composition and locally distributed on a resist film surface to hydrophobitize the resist film surface, the resin comprising:
a residual monomer in an amount of 1 mass% or less to the resin as a whole in terms of solid content, said resin being manufactured by a method comprising passing a solution containing a resin obtained by polymerization through a filter having positive ζ-potential.
19. The resin as claimed in claim 18 , wherein
the purity of a monomer for use in the synthesis of the resin is 99% or more.
20. The resin as claimed in claim 18 , wherein the method of manufacturing the resin further comprises:
removing a radical capturing material, before the polymerization, from at least one of (a) a solution containing a monomer, a radical polymerization initiator, and a solvent, and (b) a solvent in the reaction vessel.
21. The resin as claimed in claim 18 , wherein the method of manufacturing the resin further comprises:
bringing the resin obtained by polymerization into contact with an aqueous solution.
22. The resin as claimed in claim 18 , wherein the method of manufacturing the resin further comprises:
performing, after precipitation-purifying the resin obtained by polymerization, at least either treatment of (i) a repulping treatment using a poor solvent, or (ii) a rinsing treatment using a poor solvent.