E-beam defect review system
An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
1. An apparatus comprises:
an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column;
a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus;
a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam;
a storage unit for storing wafer design database; and
a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
2. The apparatus of claim 1 , wherein the host computer and storage database is a clustering computer system based on high speed network.
3. A system for automatic defects review on semiconductor integrated circles wafer comprising:
an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column;
a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus;
a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam;
a storage unit for storing wafer design database; and
a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
4. The system of claim 3 , wherein the defect locating, and defect sampling, includes a Smart Review Sampling Filter.
5. The system of claim 3 , wherein the defect classifying is can be based on the Universal Defect Locating Unit.