Method for fabricating a glass substrate, magnetic disk, and method for fabricating the same
A method for fabricating a glass substrate containing SiO 2 as a main ingredient thereof and having a uniform and minute pattern of stripes formed on the surface thereof by ultraprecision polishing includes a step of inspecting whether or not, at the topmost surface portion of the glass substrate after polishing, a given property of a bound energy of the Si atom with respect to the electrons occupying a 2P orbit as determined by XPS is equal to or less than a predetermined value, and the given property is a shift amount of the bound energy or a half-value width of the bound energy distribution, the predetermined value is 0.10 eV or 2.15 eV, respectively.
1. A method for fabricating a magnetic disk, comprising:
fabricating a magnetic disk glass substrate containing SiO 2 as a main ingredient thereof, the fabricating comprising:
polishing a surface of the glass substrate to produce a polished glass substrate; and
inspecting the polished glass substrate to check whether or not, at a topmost surface portion thereof, a given property of a bound energy of a Si atom of the SiO 2 with respect to electrons of the Si atom occupying a 2P orbit of the Si atom as determined by XPS is equal to or less than a predetermined value, wherein the given property is a shift amount of the bound energy and the predetermined value is less than or equal to 0.10 eV; and
forming a magnetic recording layer on the inspected polished glass substrate when the inspecting determines that the given property is equal to or less than the predetermined value.
2. The method according to claim 1 , further comprising: performing ultraprecision polishing on the glass substrate when the glass substrate has passed the inspecting when the given property is equal to or less than the predetermined value and prior to forming the magnetic recording layer.
3. The method according to claim 2 , wherein, after ultraprecision polishing, the topmost surface portion of the glass substrate has a surface roughness Ra of 0.3 nm or less.
4. A method for fabricating a magnetic disk, comprising:
fabricating a magnetic disk glass substrate containing SiO 2 as a main ingredient thereof, the fabricating comprising:
polishing a surface of the glass substrate to produce a polished glass substrate; and
inspecting the polished glass substrate to check whether or not, at a topmost surface portion thereof, a given property of a bound energy of a Si atom of the SiO 2 with respect to electrons of the Si atom occupying a 2P orbit of the Si atom as determined by XPS is equal to or less than a predetermined value, wherein the given property is a half-value width of a distribution of the bound energy and the predetermined value is less than or equal to 2.15 eV; and
forming a magnetic recording layer on the inspected polished glass substrate when the inspecting determines that the given property is equal to or less than the predetermined value.
5. The method according to claim 4 , further comprising: performing ultraprecision polishing on the glass substrate when the glass substrate has passed the inspecting when the given property is equal to or less than the predetermined value and prior to forming the magnetic recording layer.
6. The method according to claim 5 , wherein, after ultraprecision polishing, the topmost surface portion of the glass substrate has a surface roughness Ra of 0.3 nm or less.