Method of segmenting semiconductor wafer
To provide a method of segmenting a semiconductor wafer, which is capable of preventing chippings. A semiconductor wafer 1 is partitioned into a circumferential ring-shaped region 1 a and a segmentation region placed in the inner side of the ring-shaped region 1 a . The semiconductor wafer 1 included in the segmentation region is cut into the form of a lattice along a plurality of perpendicular cutting lines 4 and is segmented into a plurality of chips 2 . On the other hand, the semiconductor wafer 1 included in the ring-shaped region 1 a is cut along two partition lines 5 extending in parallel to the cutting lines 4 from the center O of the semiconductor wafer 1 and is partitioned into four independent regions.
1. A method of segmenting a semiconductor wafer into a plurality of chips by means of plasma etching, the semiconductor wafer being partitioned into a ring-shaped non-segmentation region including the perimeter of the semiconductor wafer and a segmentation region placed in an inner side of the ring-shaped non-segmentation region, a protective sheet being provided in a circuit forming surface of the semiconductor wafer, comprising the steps of:
segmenting the segmentation region into the plurality of chips by cutting the segmentation region along a plurality of perpendicular cutting lines; and
partitioning the ring-shaped non-segmentation region into four independent non-segmented regions by cutting the ring-shaped non-segmentation region along two partition lines extending in parallel to the perpendicular cutting lines from the center of the semiconductor wafer.
2. The method according to claim 1 , further comprising the step of masking a region which is in a rear side of the semiconductor wafer and lies in the outside of the regions corresponding to the cutting lines and the partition line, wherein the masked semiconductor wafer is subjected to plasma etching treatment to segment the segmentation region into the plurality of chips and partition the ring-shaped non-segmentation region into the four independent non-segmented regions.
3. The method according to claim 2 , further comprising the steps of:
attaching a continuous extensible maintenance sheet to the rear side of the semiconductor wafer in which the segmentation region is segmented into the plurality of chips and the ring-shaped non-segmentation region is partitioned into the four independent non-segmented regions;
peeling the protective sheet; and
expanding a gap between adjacent chips and a gap between the chips and the ring-shaped non-segmentation region by extending the maintenance sheet from an inner side to an outer side of the semiconductor wafer.
4. A method of segmenting a semiconductor wafer into a plurality of chips by means of plasma etching, the semiconductor wafer being partitioned into a ring-shaped non-segmentation region including the perimeter of the semiconductor wafer and a segmentation region placed in an inner side of the ring-shaped non-segmentation region, a protective sheet being provided in a circuit forming surface of the semiconductor wafer, comprising the steps of:
segmenting the segmentation region into the plurality of chips by cutting the segmentation region along a plurality of perpendicular cutting lines; and
partitioning the ring-shaped non-segmentation region into more than five independent non-segmented regions by cutting the ring-shaped non-segmentation region along partition lines,
wherein the partition lines include at least two partition lines extending in parallel to the perpendicular cutting lines from the center of the semiconductor wafer, and a region whose perimeter length is more than ⅛ of the entire perimeter length of the semiconductor wafer is necessarily included in each of the regions partitioned along the two partition lines.
5. The method according to claim 4 , further comprising the step of masking a region which is in a rear side of the semiconductor wafer and lies in the outside of the regions corresponding to the cutting lines and the partition line,
wherein the masked semiconductor wafer is subjected to plasma etching treatment to segment the segmentation region into the plurality of chips and partition the ring-shaped non-segmentation region into more than five independent non-segmented regions.
6. The method according to claim 5 , further comprising the steps of:
attaching a continuous extensible maintenance sheet to the rear side of the semiconductor wafer in which the segmentation region is segmented into the plurality of chips and the ring-shaped non-segmentation region is partitioned into more than five independent non-segmented regions;
peeling the protective sheet; and
expanding a gap between adjacent chips and a gap between the chips and the ring-shaped non-segmentation region by extending the maintenance sheet from an inner side to an outer side of the semiconductor wafer.
7. The method according to claim 1 , wherein the perpendicular cutting lines do not reach the perimeter of the semiconductor wafer, and the two partition lines reach the perimeter of the semiconductor wafer.
8. The method according to claim 4 , wherein the perpendicular cutting lines do not reach the perimeter of the semiconductor wafer, and the two partition lines reach the perimeter of the semiconductor wafer.
9. The method according to claim 1 , wherein each of independent non-segmented regions has an area larger than each of the plurality of chips.
10. The method according to claim 4 , wherein each of independent non-segmented regions has an area larger than each of the plurality of chips.