Exposure apparatus
An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage and is configured to hold the original, an electrode which is provided outside the electrostatic chuck on the stage via an insulator, and an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode. The particle adherence to the original can be effectively avoided.
1. An exposure apparatus configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light, the exposure apparatus comprising:
a stage configured to move at the time of exposure;
an electrostatic chuck which is provided on the stage and is configured to hold the original;
an electrode which is provided outside the electrostatic chuck on the stage via an insulator; and
an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode, wherein the electric field forming member is an optical barrel of a projection optical system.
2. The exposure apparatus according to claim 1 , wherein the electric field forming member has an electric potential equal to that of the original.
3. The exposure apparatus according to claim 1 , wherein a value of y/L is equal to or lower than 35, where a width of the electrode is L and a distance between the electrode and the electric field forming member is y.
4. An exposure apparatus configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light, the exposure apparatus comprising:
a stage configured to move at the time of exposure;
an electrostatic chuck which is provided on the stage and is configured to hold the original;
an electrode which is provided outside the electrostatic chuck on the stage via an insulator; and
an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode, wherein the electric field forming member is an optical path limiting member which is positioned between an optical barrel of an projection optical system and the stage.
5. The exposure apparatus according to claim 4 , further comprising a dustproof plate configured to prevent a particle from entering a space between the optical path limiting member and the optical barrel.
6. An exposure apparatus configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light, the exposure apparatus comprising:
a stage configured to move at the time of exposure;
an electrostatic chuck which is provided on the stage and is configured to hold the original;
an electrode which is provided outside the electrostatic chuck on the stage via an insulator;
an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode; and
an electric field shielding member which is provided between the electrostatic chuck on the stage and the electrode and is configured to prevent an electric field formed between the electrode and the electric field forming member from influencing the stage.
7. The exposure apparatus according to claim 6 , wherein the electric field shielding member is integrated with the insulator.