Surface-modified indium-tin oxides
Surface-modified indium-tin oxides are produced by mixing the oxides with the surface-modifying agent in liquid or vapor form and heat treating the mixture. They can be used to produce coating systems.
1. Surface-modified particles containing pyrogenically produced indium-tin oxides, characterised by
BET specific surface areas:
0.1-299 m 2 /g
pH:
2.5-9.5
C content:
0.1 to 15%
obtained by treating pyrogenically produced oxides with silanes as surface-modifying agents whilst being mixed and heating the mixture at a temperature of 50 to 400° C. for a period of 1 to 6 hours.
2. Process for producing the surface-modified particles containing indium-tin oxides as defined in claim 1 , comprising spraying pyrogenically produced indium-tin oxides with silanes as surface-modifying agents whilst being mixed and heat treating the mixture at a temperature of 50 to 400° C. for a period of 1 to 6 hours.
3. Process for producing the surface-modified particles containing indium-tin oxides as defined in claim 1 , comprising spraying pyrogenically produced indium-tin oxides with silanes as surface-modifying agents in vapour form whilst being mixed and heat treating the mixture at a temperature of 50 to 800° C. for a period of 0.5 to 6 hours.
4. A coating composition comprising the surface-modified particles containing indium-tin oxides of claim 1 and a carrier.
5. The surface-modified particles containing pyrogenically produced indium-tin oxides according to claim 1 , wherein the silane is selected from the group consisting of octyl trimethoxysilane, octyl triethoxysilane, hexamethyl disilazane, 3-methacryloxypropyl trimethoxysilane, 3-methacryloxypropyl triethoxysilane, hexadecyl trimethoxysilane, hexadecyl triethoxysilane, dimethyl polysiloxane, glycidyloxypropyl trimethoxysilane, glycidyloxypropyl triethoxysilane, nonafluorohexyl trimethoxysilane, tridecafluorooctyl trimethoxysilane, tridecafluorooctyl triethoxysilane, and aminopropyl triethoxysilane.
6. The process according to claim 3 , wherein the silane is selected from the group consisting of octyl trimethoxysilane, octyl triethoxysilane, hexamethyl disilazane, 3-methacryloxypropyl trimethoxysilane, 3-methacryloxypropyl triethoxysilane, hexadecyl trimethoxysilane, hexadecyl triethoxysilane, dimethyl polysiloxane, glycidyloxypropyl trimethoxysilane, glycidyloxypropyl triethoxysilane, nonafluorohexyl trimethoxysilane, tridecafluorooctyl trimethoxysilane, tridecafluorooctyl triethoxysilane, and aminopropyl triethoxysilane.
7. The process according to claim 4 , wherein the silane is selected from the group consisting of octyl trimethoxysilane, octyl triethoxysilane, hexamethyl disilazane, 3-methacryloxypropyl trimethoxysilane, 3-methacryloxypropyl triethoxysilane, hexadecyl trimethoxysilane, hexadecyl triethoxysilane, dimethyl polysiloxane, glycidyloxypropyl trimethoxysilane, glycidyloxypropyl triethoxysilane, nonafluorohexyl trimethoxysilane, tridecafluorooctyl trimethoxysilane, tridecafluorooctyl triethoxysilane, and aminopropyl triethoxysilane.