IP Library Granted Patent US 8,164,060
Granted Patent B2
US 8,164,060 · App. 12/832,127 · Granted Apr 24, 2012

System and method for a charged particle beam

Assignee: Hermes-Microvision, Inc.
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Quick Facts
Patent No.
US 8,164,060
App. No.
12/832,127
Granted
Apr 24, 2012
Kind
B2
Abstract

System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

Claims (44)

1. A charged particle beam apparatus, comprising:

a charged particle source for generating a primary charged particle beam;

at least one condenser lens for condensing the primary charged particle beam;

a compound objective lens for focusing the primary charged particle beam to a specimen on a stage system, the compound objective lens comprising:

a first magnetic lens;

a second magnetic lens, wherein a shared pole piece is configured for both the first magnetic lens and the second magnetic lens; and

an electrostatic lens; and

a detection system for detecting charged particles or X-ray emanated from the specimen.

2. The charged particle beam apparatus of claim 1 , wherein the first magnetic lens comprises an upper pole piece and a first excitation coil with the shared pole piece and the upper pole piece.

3. The charged particle beam apparatus of claim 2 , wherein the second magnetic lens comprises a lower pole piece and a second excitation coil within the shared pole piece and the lower pole piece.

4. The charged particle beam apparatus of claim 3 , wherein the shared pole piece is isolated from the upper pole piece.

5. The charged particle beam apparatus of claim 4 , wherein the shared pole piece is isolated from the lower pole piece.

6. The charged particle beam apparatus of claim 5 , wherein the electrostatic lens comprises the upper pole piece, the shared pole piece, and the specimen.

7. The charged particle beam apparatus of claim 6 , wherein the first magnetic lens is conical.

8. The charged particle beam apparatus of claim 7 , wherein the second magnetic lens is an immersion lens.

9. The charged particle beam apparatus of claim 3 , wherein the lower pole piece is isolated from the second magnetic lens.

10. The charged particle beam apparatus of claim 5 , wherein the lower pole piece is isolated from the second magnetic lens.

11. The charged particle beam apparatus of claim 1 , wherein the shared pole piece is electrically isolated from the first magnetic lens and the second magnetic lens.

12. A scanning electron microscope, comprising:

an electron source for generating a primary electron beam;

at least one condenser lens for condensing the primary electron beam;

a compound objective lens for focusing the primary electron beam to a specimen on a stage system, the compound objective lens comprising:

a conical magnetic lens;

an immersion magnetic lens, wherein a shared pole piece is configured for both the conical magnetic lens and the immersion magnetic lens; and

an electrostatic lens;

a deflection system for deflecting the primary electron beam over a surface of the specimen to form a scanning pattern; and

a detection system for detecting secondary electrons or X-ray emanated from the specimen.

13. The scanning electron microscope of claim 12 , wherein the shared pole piece is electrically isolated from the conical magnetic lens and the immersion magnetic lens.

14. The scanning electron microscope of claim 13 , wherein the conical magnetic lens comprises an upper pole piece and a first excitation coil with the shared pole piece and the upper pole piece.

15. The scanning electron microscope of claim 14 , wherein the immersion magnetic lens comprises a lower pole piece and a second excitation coil within the shared pole piece and the lower pole piece.

16. The scanning electron microscope of claim 15 , wherein the shared pole piece is isolated from the upper pole piece and the lower pole piece.

17. The scanning electron microscope of claim 16 , wherein the lower pole piece is isolated from the immersion magnetic lens.

18. The scanning electron microscope of claim 15 , wherein the electrostatic lens comprises the upper pole piece, the shared pole piece, and the specimen.

19. The scanning electron microscope of claim 12 , further comprising an ExB filter for aligning or bending the secondary electrons to the detection system.

20. An E-beam inspection apparatus, comprising:

an electron source for generating a primary electron beam;

at least one condenser lens for condensing the primary electron beam;

a compound objective lens for focusing the primary electron beam to a specimen on a stage system, the compound objective lens comprising:

a conical magnetic lens including an upper pole piece, a shared pole piece, and a first excitation coil with the shared pole piece and the upper pole piece;

an immersion magnetic lens including a lower pole piece, the shared pole piece and a second excitation coil within the shared pole piece and the lower pole piece; and

an electrostatic lens configured by the upper pole piece, the shared pole piece, and the specimen;

a deflection system for deflecting the primary electron beam over a surface of the specimen to form a scanning pattern;

a detection system for detecting secondary electrons or X-ray emanated from the specimen; and

an ExB filter for aligning or bending the secondary electrons to the detection system.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 054866/0742 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 054870/0156 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2011
From: LIU, XUEDONG; ZHANG, XU; WANG, JOE; TSENG, EDWARD; CHEN, ZHONGWEI
To: HERMES-MICROVISION, INC.
Reel/Frame 027328/0565 →
Continuity (3)
Continuation 11923012 · Oct 24, 2007
Provisional Application 60862943 · Oct 25, 2006
Related Publication 20100270468A1 · Oct 28, 2010