Chemical-mechanical planarization pad
The present disclosure relates to a polishing pad including a chemical agent present in an amount sufficient to be released and dissolving into an aqueous abrasive particle polishing medium during chemical mechanical planarization and reducing abrasive particle agglomeration and a binder. The pad includes a surface such that as the pad is abraded the surface is renewed exposing at least a portion of the chemical agent.
1. A polishing pad, comprising:
a chemical agent at a molecular weight of 10,000 to 500,000 present in an amount sufficient to be released and dissolving into an aqueous abrasive particle polishing medium during chemical mechanical planarization and reducing abrasive particle agglomeration;
a binder, formed into the pad, wherein said pad includes a surface and wherein as said pad is abraded, the surface is renewed exposing at least a portion of said chemical agent;
wherein said chemical agent is coated on fibers;
wherein the fibers comprise fibers soluble in the aqueous abrasive particle polishing medium during chemical mechanical planarization;
wherein said chemical agent comprises polyvinyl alcohol sourced from polyvinyl acetate and exhibits greater than 50% hydrolysis of said polyvinyl acetate precursor wherein said polyvinyl alcohol is present in a range of 0.1 to 50.0% by volume of said pad.
2. The polishing pad of claim 1 wherein the chemical agent forms a three-dimensional network within the pad.
3. The polishing pad of claim 1 , wherein said fibers further comprise fibers insoluble in the aqueous abrasive particle polishing medium during chemical mechanical planarization.
4. The polishing pad of claim 1 , wherein said chemical agent further comprises particles dispersed within said pad.
5. The polishing pad of claim 1 , including a second chemical agent that does not dissolve in said aqueous abrasive particle polishing medium and wherein said second chemical agent imparts a desired level of hydrophobicity or hydrophilicity to said pad surface.
6. The polishing pad of claim 1 , wherein said chemical agent is localized to a region of the pad providing a localized relative concentration.
7. The polishing pad of claim 1 , including a dispersant comprising one of polyethylene glycol and sodium dodecylbenzenesulfone.
8. A method of forming a polishing pad, comprising:
combining a chemical agent into a binder wherein said chemical agent has a molecular weight of 10,000 to 500,000 and is present in an amount sufficient to be released and dissolve into an aqueous abrasive particle polishing medium during chemical mechanical planarization and reducing abrasive particle agglomeration, wherein said chemical agent is coated on fibers and the fibers comprise fibers soluble in the aqueous abrasive particle polishing medium during chemical mechanical planarization, wherein said chemical agent comprises polyvinyl alcohol sourced from polyvinyl acetate and exhibits greater than 50% hydrolysis of said polyvinyl acetate precursor wherein said polyvinyl alcohol is present in a range of 0.1 to 50.0% by volume of said pad; and
forming said binder and chemical agent into a chemical mechanical planarization polishing pad.
9. The method of claim 8 wherein the chemical agent forms a three-dimensional network within the pad.
10. The method of claim 8 , wherein said fibers further comprise fibers insoluble in the aqueous abrasive particle polishing medium during chemical mechanical planarization.
11. The method of claim 8 , wherein said chemical agent further comprises particles dispersed within said pad.
12. The method of claim 8 , including a second chemical agent that does not dissolve in said aqueous abrasive particle polishing medium and wherein said second chemical agent imparts a desired level of hydrophobicity or hydrophilicity to said pad surface.
13. The method of claim 8 , wherein said chemical agent is localized to a region of the pad providing a localized relative concentration.
14. The method of claim 8 , wherein said polishing pad includes a dispersant comprising one of polyethylene glycol and sodium dodecylbenzenesulfone.
15. A method of polishing with a polishing pad,
comprising:
providing a pad comprising a chemical agent combined into a binder wherein said chemical agent has a molecular weight of 10,000 to 500,000 and is present in an amount sufficient to be released and dissolve into an aqueous abrasive particle polishing medium during chemical mechanical planarization and reducing abrasive particle agglomeration, wherein said chemical agent is coated on fibers and the fibers comprise fibers soluble in the aqueous abrasive particle polishing medium during chemical mechanical planarization, wherein said chemical agent comprises polyvinyl alcohol sourced from polyvinyl acetate and exhibits greater than 50% hydrolysis of said polyvinyl acetate precursor wherein said polyvinyl alcohol is present in a range of 0.1 to 50.0% by volume of said pad;
contacting a surface of said polishing pad with a substrate;
abrading said pad and exposing at least a portion of said chemical agent and said fibers;
dissolving the exposed portion of said chemical agent and said fibers in the aqueous abrasive particle polishing medium during chemical mechanical planarization.
16. The method of claim 15 , wherein said polishing pad includes a dispersant comprising one of polyethylene glycol and sodium dodecylbenzenesulfone.