Organosilicate resin formulation for use in microelectronic devices
View Patent ↗Silane compositions having an aromatic functionality and a ethylenically functionality and comprising a latent acid catalyst are deposited in two or more layers on a substrate. Each layer differs in light absorption properties from an adjacent layer. Some layers may have different curing mechanisms. Such a method is useful in forming antireflective coatings.
1. A method of forming an antireflective coating on a substrate comprising:
providing a substrate,
depositing and curing two or more layers of organosilicate composition in a layer over at least a portion of the substrate or over one or more intermediate layers applied over said substrate, and
characterized in that each layer of organosilicate composition differs in light absorption properties from an adjacent layer and comprises a latent acid catalyst and the following silanes or the hydrolyzed or partially hydrolyzed product of the following silanes
(a) an alkoxy or acyloxy silane having at least one group containing ethylenic unsaturation which group is bonded to the silicon atom
(b) an alkoxy or acyloxy silane having at least one group containing an aromatic ring which group is bonded to the silicon atom, and
(c) optionally an alkoxy or acyloxy silane having at least one C 1 -C 6 alkyl group bonded to the silicon.
2. The method of claim 1 wherein at least two of the two or more layers of the organosilicate have different curing mechanisms.
3. The method of claim 1 wherein for at least one of the layers of organosilicate composition the first silane (a) is vinyl acetoxy silane and the second silane (b) is an arylalkoxysilane.
4. The method of claim 1 wherein for at least one of the layers of organosilicate, the organosilicate composition comprises the following silanes or they hydrolyzed or partially hydrolyzed reaction product of the following silanes
(a) 50-95 mole percent silanes of the formula
wherein R a is C 1 -C 6 alkylidene, C 1 -C 6 alkylene, arylene, or a direct bond; Y a is C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2-6 alkynyl, C 6 -C 20 aryl, 3-methacryloxy, 3-acryloxy, 3-aminoethyl-amino, 3-amino, —SiZ a 2 OX a , or —OX a ; X a is independently, in each occurrence, a C 1 -C 6 alkyl or C 2 -C 6 acyl; and Z a is C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2 - 6 alkynyl, C 6-20 aryl, or —OX a , with the proviso, that at least one of Y a , Z a is ethylenically unsaturated,
(b) 5 to 40 mole percent
wherein R b is C 1 -C 6 alkylidene, C 1 -C 6 alkylene, arylene or a direct bond; Y b is C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2-6 alkynyl, C 6 -C 20 aryl, 3-methacryloxy, 3-acryloxy, 3-aminoethyl-amino, 3-amino, —SiZ b 2 OX b , or —OX b ; X b is independently, in each occurrence, a C 1 -C 6 alkyl or C 2 -C 6 acyl; and Z b is C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2 - 6 alkynyl, C 6-20 aryl, or —OX b , provided at least one of Y b , Z b or X b comprises an aromatic ring, and
(c) 0 to 45 mole percent
wherein R c is C 1 -C 6 alkylidene, C 1 -C 6 alkylene, arylene or a direct bond; Y c is C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2-6 alkynyl, C 6 -C 20 aryl, 3-methacryloxy, 3-acryloxy, 3-aminoethyl-amino, 3-amino, —SiZ c 2 OX c , or —OX c ; X c is independently, in each occurrence, a C 1 -C 6 alkyl or C 2 -C 6 acyl; and Z C is C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 2 - 6 alkynyl, C 6-20 aryl, or —OX c , provided at least one of Z C or the combination of R c —Y c comprises a C 1-6 alkyl group,
said mole percent is based on total moles of silanes (a), (b) and (c) present.
5. The method of claim 1 wherein for at least one of the layers of organosilicate composition the group containing an aromatic ring is a phenyl or anthracenyl group.