Power supply apparatus and deposition method using the power supply apparatus

1. A power supply apparatus comprising:

a substrate holder having an electrostatic chuck which generates an attracting force for holding a substrate, wherein a first electrode is arranged inside said electrostatic chuck and generates the attracting force;

a strut which rotatably supports said substrate holder and is rotatable around a central axis;

a rotational driving mechanism which rotates said substrate holder via said strut;

a first housing configured to support said strut, wherein first electric power from a first external power supply connected to said first housing is supplied to the first electrode of said electrostatic chuck via said first housing;

a first conductive annular member which is arranged around the central axis and is fixed to an end portion of said strut, and which is configured to rotate together with said strut;

a second conductive annular member which is arranged around the central axis and is fixed to said first housing, and which is brought into direct surface contact with said first conductive annular member, wherein an upper surface of said second conductive annular member and a lower surface of said first conductive annular member have a surface contact sliding relationship;

a third conductive annular member which is arranged around the central axis and is fixed to said strut, and which is configured to rotate together with said strut, wherein a first gap is formed between an inner circumferential surface of said first conductive annular member and an outer circumferential surface of said third conductive annular member;

a fourth conductive annular member which is arranged around the central axis and is fixed to said first housing, wherein a second gap is formed between an inner circumferential surface of said second conductive annular member and an outer circumferential surface of said fourth conductive annular member, and an upper surface of said fourth conductive annular member and a lower surface of said third conductive annular member have a surface contact sliding relationship;

a first power supply member which is arranged inside said strut and which supplies the first electric power to said first electrode of said electrostatic chuck via said first and second conductive annular members, and said third and fourth conductive annular members,

wherein said first housing has a first channel which is formed to supply fluid into the first and second gaps.

2. The apparatus according to claim 1 , further comprising:

a second electrode which is arranged inside said electrostatic chuck;

a fifth conductive annular member which is arranged around the central axis and is fixed to said strut, and which is configured to rotate together with said strut;

a second housing which is configured to support said strut, wherein second electric power from a second external power supply connected to said second housing is supplied to said second electrode of said electrostatic chuck via said second housing;

a sixth conductive annular member which is arranged around the central axis and is fixed to said second housing, and which is brought into direct surface contact with said fifth conductive annular member, wherein an upper surface of said sixth conductive annular member and a lower surface of said fifth conductive annular member have a surface contact sliding relationship;

a second power supply member which is arranged inside said strut and is arranged inside said first and second conductive annular members, and which supplies the second electric power to said second electrode of said electrostatic chuck via said fifth and sixth conductive annular members.

3. The apparatus according to claim 2 , further comprising:

a seventh conductive annular member which is arranged around the central axis and is fixed to said strut, and which is configured to rotate together with said strut, wherein a third gap is formed between an inner circumferential surface of said fifth conductive annular member and an outer circumferential surface of said seventh conductive annular member;

an eighth conductive annular member which is arranged around the central axis and is fixed to said second housing, wherein a fourth gap is formed between an inner circumferential surface of said sixth conductive annular member and an outer circumferential surface of said eighth conductive annular member, and an upper surface of said eighth conductive annular member and a lower surface of said seventh conductive annular member have a surface of sliding relationship,

wherein said housing has a second channel which is formed to supply fluid into the third and fourth gaps.

4. The apparatus according to claim 1 , wherein

a projection is formed on a upper surface of said second conductive annular member, and wherein said projection has a sectional area smaller than a surface contact sliding area between said first and second conductive annular members.

5. The apparatus according to claim 4 , further comprising:

an elastic member configured to bias the second conductive annular member and said projection to said first conductive annular member.

6. A deposition method of performing deposition on a substrate, comprising the steps of:

placing, on a stage, a substrate transferred into a vacuum chamber;

supplying a voltage to an electrode of an electrostatic chuck from an external power supply by using the power supply apparatus of claim 1 , and fixing the substrate placed on the stage by an attracting force generated by the electrostatic chuck;

rotating the substrate holder;

supplying a gas into the vacuum chamber at a predetermined flow rate; and

depositing a material sputtered from a target onto the substrate by performing discharge to the gas.

7. A vacuum processing apparatus comprising:

the power supply apparatus of claim 1 , arranged in a vacuum chamber including an exhaust device;

a gas supply device constructed to introduce, into the vacuum chamber, gas used for generating plasma; and

a fixing unit constructed to fix a target in the vacuum chamber.