Surface wave enabled darkfield aperture
Embodiments of the present invention relate to a surface wave enabled darkfield aperture structure comprising an aperture layer, a aperture in the aperture layer and a plurality of grooves around the aperture. The aperture layer has a first and second surface. The plurality of grooves is in the first surface. A surface wave propagates along at least the first surface. The plurality of grooves is configured to generate a darkfield at the aperture by modifying the surface wave to cancel out direct transmission of a uniform incident light field received by the aperture.
1. A surface wave enabled darkfield aperture structure comprising:
an aperture layer having a first surface and a second surface, wherein a surface wave propagates along the first surface;
an aperture in the aperture layer;
a plurality of grooves in the first surface around the aperture, the plurality of grooves configured to generate a darkfield at the aperture by modifying the surface wave to cancel out direct transmission of a uniform incident light field received by the aperture.
2. The surface wave enabled darkfield aperture structure of claim 1 , wherein the plurality of grooves is further configured to pass light of a non-uniform light field through the aperture.
3. The surface wave enabled darkfield aperture structure of claim 1 , wherein the surface wave is modified to be about 180 degrees out of phase from the direct transmission.
4. The surface wave enabled darkfield aperture structure of claim 1 , wherein the surface wave is modified to be similar in amplitude to the direct transmission.
5. The surface wave enabled darkfield aperture structure of claim 1 , wherein the aperture and the plurality of grooves are configured to enhance light passed through the aperture under a non-uniform light field.
6. The surface wave enabled darkfield aperture structure of claim 1 , wherein the aperture and the plurality of grooves are configured to enhance light passed through the aperture when a non-homogenous object disrupts the uniform light field.
7. The surface wave enabled darkfield aperture structure of claim 1 , wherein the aperture and the plurality of grooves are configured to modify the direct transmission based on a degree if polarity of the uniform light field.
8. The surface wave enabled darkfield aperture structure of claim 1 , wherein the aperture has a darkfield suppression factor of at least 1000.
9. The surface wave enabled darkfield aperture structure of claim 1 , wherein each of the plurality of grooves is circular.
10. The surface wave enabled darkfield aperture structure of claim 1 , wherein at least one of the plurality of grooves is linear.
11. The surface wave enabled darkfield aperture structure of claim 1 , further comprising a second plurality of grooves in the second surface of the aperture layer, wherein the second plurality of grooves modifies a second surface wave propagated along the second surface.
12. A surface wave enabled darkfield aperture sensor comprising:
an aperture layer having a first surface and a second surface, wherein a surface wave propagates along the first surface;
a plurality of apertures in the aperture layer;
a plurality of grooves in the first surface around each corresponding aperture, the plurality of grooves configured to generate a darkfield at the aperture by modifying the surface wave to cancel out direct transmission of a uniform incident light field received by the aperture; and
a light detector adapted to detect light passing through the apertures.
13. The surface wave enabled darkfield aperture sensor of claim 12 , wherein the plurality of grooves is further configured to pass light of a non-uniform light field through the corresponding aperture.
14. The surface wave enabled darkfield aperture sensor of claim 12 , further comprising a transparent layer between the aperture layer and the light detector.
15. The surface wave enabled darkfield aperture sensor of claim 12 , wherein the plurality of apertures is arranged in a two-dimensional array.