IP Library › Granted Patent US 8,193,973
Granted Patent B2
US 8,193,973 · App. 12/803,270 · Granted Jun 5, 2012

Multilayer metamaterial isolator

Assignee: Raytheon Company
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Quick Facts
Patent No.
US 8,193,973
App. No.
12/803,270
Granted
Jun 5, 2012
Kind
B2
Abstract

A method of fabricating an array of radiating elements includes on one layer or surface of a dielectric substrate, forming a first leg of a first resonator loop, on another layer or surface of the dielectric substrate forming a second leg of the first resonator loop between adjacent radiating elements, forming a via through the dielectric substrate, and metallizing the via forming a third leg of the first resonator loop interconnecting the first and second legs.

Claims (25)

1. A method of fabricating an array of radiating elements, the method comprising:

on one layer or surface of a dielectric substrate, forming a first leg of a first resonator loop;

on another layer or surface of the dielectric substrate forming a second leg of the first resonator loop between adjacent radiating elements;

forming a via through the dielectric substrate; and

metallizing the via forming a third leg of the first resonator loop interconnecting the first and second legs,

fabricating a second resonator loop by:

forming a first leg adjacent the first leg of the first resonator loop,

forming a second leg adjacent the second leg of the first resonator loop, and

forming a third leg extending through the dielectric substrate interconnecting the first and second legs of the second resonator loop.

2. The method of claim 1 in which the adjacent radiating elements are formed on the same layer as the second leg.

3. The method of claim 1 further including forming interdigitated spaced fingers of the first and second resonator loops.

4. The method of claim 1 in which the first resonator loop constitutes a unit cell, the method further including forming a strip of adjacent unit cells.

5. A method to fabricate a multilayer metamaterial isolator, the method comprising:

on one layer or surface of a multilayer dielectric substrate, forming a first leg of a first resonator loop;

on another layer or surface of the multilayer dielectric substrate forming a second leg of the first resonator loop between adjacent radiating elements;

forming a via through the dielectric substrate; and

metallizing the via forming a third leg of the first resonator loop interconnecting the first and second legs.

6. The method of claim 5 in which the adjacent radiating elements are formed on the same layer as the second leg.

7. The method of claim 5 , further comprising:

fabricating a second resonator loop by:

forming a first leg adjacent the first leg of the first resonator loop,

forming a second leg adjacent the second leg of the first resonator loop, and

forming a third leg extending through the dielectric substrate interconnecting the first and second legs of the second resonator loop.

8. The method of claim 7 further including forming interdigitated spaced fingers of the first and second resonator loops.

9. The method of claim 5 in which the first resonator loop constitutes a unit cell, the method further including forming a strip of adjacent unit cells.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 6, 2012
From: MORTON, MATTHEW A.; IMHOLT, JIYUN C.; BUELL, KEVIN
To: RAYTHEON COMPANY
Reel/Frame 027491/0358 →
Continuity (2)
Division 12286332 · Sep 30, 2008
Related Publication 20100263199A1 · Oct 21, 2010