Integrated gas panel apparatus
Provided is an integrated gas panel apparatus which has excellent responsiveness, stabilizes gas concentration, and furthermore, can keep a conventional panel shape as it is. A panel body comprises at least a main flow channel block body for forming a main flow channel, and a branch flow channel block body for forming a branch flow channel. The branch flow channel block bodies are arranged on the both right and left sides to face each other by having the main flow channel block body at the center.
1. An integrated gas panel apparatus comprising multiple branch flow channels in a course of which a gas control unit such as a valve or a mass flow controller is arranged so as to control gas that flows inside the branch flow channels, a single main flow channel into which the gas from each of the branch flow channels flows and joins, and a panel body of a manifold type inside of which the branch flow channels and the main flow channel are formed by assembling multiple block bodies, wherein
the panel body comprises a main flow channel block body that forms the main flow channel, and branch flow channel block bodies that are arranged to face each other by having the main flow channel block body at the center and that forms the branch flow channels.
2. The integrated gas panel apparatus described in claim 1 , wherein
a first junction where a first branch flow channel joins the main flow channel and a second junction where a second branch flow channel that faces the above-mentioned first branch flow channel across the main flow channel joins the main flow channel, are set at generally the same position in an elongating direction of the main flow channel.
3. The integrated gas panel apparatus described in claim 2 , wherein
an exit pipe of the first branch flow channel is arranged to project inward from an inside surface of the main flow channel by a predetermined length at the above-mentioned first junction.
4. The integrated gas panel apparatus described in claim 1 , wherein
the gas is used for a semiconductor manufacturing process.
5. An integrated gas panel apparatus comprising multiple branch flow channels in a course of which a gas control unit such as a valve or a mass flow controller is arranged so as to control gas that flows inside the branch flow channels, a main flow channel into which the gas from each of the branch flow channels flows, and a panel body inside of which the branch flow channels and the main flow channel are formed by assembling multiple block bodies, wherein
an insertion bore that is in communication with the main flow channel is formed in a main flow channel block body inside of which the main flow channel is arranged, and a projecting pipe that projects an associated branch flow channel outside is arranged on a branch flow channel block body inside of which an exit portion of the associated branch flow channel is provided,
a distal end of the projecting pipe further projects inward from an inside surface of the main flow channel in a state wherein the main flow channel block body and the branch flow channel block body are assembled by inserting the projecting pipe into the insertion bore.
6. The integrated gas panel apparatus described in claim 5 , wherein
the distal end of the projecting pipe is set to reach near a center of the main flow channel in a cross section.
7. The integrated gas panel apparatus described in claim 5 , wherein
the gas is used for a semiconductor manufacturing process.