IP Library Granted Patent US 8,198,389
Granted Patent B2
US 8,198,389 · App. 11/753,904 · Granted Jun 12, 2012

Mold release compounds using cycloaliphatic epoxide functionalized polydimethylsiloxane coatings and photo-initiated polymerization

Assignee: The University of Akron
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,198,389
App. No.
11/753,904
Granted
Jun 12, 2012
Kind
B2
Abstract

The present invention is generally related to mold release compounds having improved cure times, environmental friendliness and durability that are formed from cycloaliphatic epoxide functionalized polydimethylsiloxane compounds In still another embodiment, the present invention relates to mold release compounds that are formed from cycloaliphatic epoxide functionalized poly(dimethylsiloxane-co-methylhydrosiloxane) compounds.

Claims (9)

1. A process of making a mold release coating compound comprising the steps of

(A) combining and reacting hydride terminated poly(dimethylsiloxane-co-methylhydrosiloxane), 4-vinyl-1-cyclohexene diepoxide and a rhodium catalyst in a reaction vessel to yield a cycloaliphatic epoxide functionalized polydimethylsiloxane compound;

(B) mixing the cycloaliphatic epoxide functionalized polydimethylsiloxane compound with a photoinitiator and a photosensitizer to yield a mixture;

(C) coating the mixture on a surface to provide release characteristics; and

(D) curing the coating with visible light,

wherein the cycloaliphatic epoxide functionalized polydimethylsiloxane compound is functionalized with at least two cycloaliphatic epoxides with at least one cycloaliphatic epoxide being located on a terminal silicon atom and at least one cycloaliphatic epoxide being located on an internal silicon atom.

2. The process of claim 1 , wherein the photoinitiator is selected from iodonium, sulfonium salts of very strong acids, and mixtures thereof.

3. The process of claim 1 , wherein the photosensitizer is selected from anthracene, phenanthrene, methylene blue, phthalocanine, carbazoles and mixtures thereof.

4. The process of claim 1 , wherein the photosensitizer is present in an amount of 0.01 to 10 percent by weight.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2007
From: SOUCEK, MARK D.; DWORAK, DAVID P.
To: AKRON, UNIVERSITY OF
Reel/Frame 019532/0856 →
Continuity (2)
Provisional Application 60808512 · May 25, 2006
Related Publication 20070287763A1 · Dec 13, 2007