Nanoimprint resist, nanoimprint mold and nanoimprint lithography

1. A method for making a nanoimprint mold, comprising:

(S 11 ) providing a flexible body, depositing a polymer compound on the flexible body, wherein the polymer compound is a nanoimprint resist comprising a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator;

(S 12 ) providing a master stamp having a plurality of projecting portions and gaps forming a nanopattern, pressing the nanopattern into the polymer compound on the flexible body; and

(S 13 ) curing the polymer compound, separating the master stamp from the flexible body.

2. The method of claim 1 , wherein the HP is polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid, or polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.

3. The method of claim 2 , wherein a chemical structure of the HP is:

4. The method of claim 1 , wherein the diluent solvent is 2-hydroxyethyl methacrylate or 2-Hydroxy Ethyl 2-methyl ethylene.

5. The method of claim 1 , wherein in the nanoimprint resist, a weight percent of the HP is in a range from about 50 wt % to about 60 wt %, a weight percent of the PFPE is in a range from about 3 wt % to about 5 wt %, a weight percent of the MMA is in a range from about 5 wt % to about 10 wt %, a weight percent of the diluents solvent is in a range from about 25 wt % to about 35 wt %, and a weight percent of the photo initiator is in a range from about 0.1% to about 2%.

6. The method of claim 1 , wherein the polymer compound is cured via UV light.

7. The method of claim 1 , wherein in step (S 11 ), an adhesive layer is deposited on the flexible body before depositing the polymer compound, and the adhesive layer is made of methacrylatesilane.

8. A method for making a nanoimprint mold, comprising:

(S 21 ) providing a master stamp having a plurality of projecting portions and gaps, the projecting portions and the gaps together forming a nanopattern;

(S 22 ) depositing a polymer compound to cover the nanopattern, and filling the polymer compound into the gaps, wherein the polymer compound is a nanoimprint resist comprising a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator;

(S 23 ) applying the flexible body to the polymer compound and compressing the flexible body and the master stamp; and

(S 24 ) curing the polymer compound and separating the flexible body from the master stamp.

9. The method of claim 8 , wherein the HP is polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid, or polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.

10. The method of claim 9 , wherein a chemical structure of the HP is:

11. The method of claim 8 , wherein the diluent solvent is 2-hydroxyethyl methacrylate or 2-Hydroxy Ethyl 2-methyl ethylene.

12. The method of claim 8 , wherein in the nanoimprint resist, a weight percent of the HP is in a range from about 50 wt % to about 60 wt %, a weight percent of the PFPE is in a range from about 3 wt % to about 5 wt %, a weight percent of the MMA is in a range from about 5 wt % to about 10 wt %, a weight percent of the diluents solvent is in a range from about 25 wt % to about 35 wt %, and a weight percent of the photo initiator is in a range from about 0.1% to about 2%.

13. The method of claim 8 , wherein the polymer compound is cured via UV light.

14. The method of claim 8 , wherein in step (S 23 ), an adhesive layer is deposited on the flexible body before applying the flexible body to the polymer compound, and the adhesive layer is made of methacrylatesilane.