Material for forming electroless plate and method for forming electroless plate using the same
View Patent ↗A material for electroless plating shows good adhesion for a catalyst and does not cause delamination of a catalyst adhering layer from a non-conductive base material in a catalyst adhering step, development step or other step. In a material for electroless plating, having a catalyst adhering layer on a non-conductive base material, the catalyst adhering layer is formed from a hydrophilic and/or water-soluble resin containing hydroxyl group, and a curable layer formed from a resin having hydroxyl group and an isocyanate type compound is provided between the base material and the catalyst adhering layer. The catalyst adhering layer is preferably formed while isocyanate groups of the isocyanate type compound in the curable layer remain.
1. A material for electroless plating, comprising:
a non-conductive base material;
a catalyst adhering layer provided on the non-conductive base material, wherein the catalyst adhering layer is formed from a hydrophilic and/or water-soluble resin containing hydroxyl group; and
a curable layer formed from a resin having hydroxyl group and having a hydroxyl value of 1 to 30 mgKOH/g and an isocyanate compound is provided between the base material and the catalyst adhering layer; and
catalytic metal particles adhered to the catalyst adhering layer.
2. The material for electroless plating according to claim 1 , wherein the catalyst adhering layer is formed while isocyanate groups of the isocyanate compound in the curable layer remain.
3. The material for electroless plating according to claim 1 , wherein the catalyst adhering layer contains a blocked isocyanate compound masked with a masking agent.
4. The material for electroless plating according to claim 1 , wherein the curable layer has a thickness of 2 μm or less.
5. The material for electroless plating according to claim 1 wherein the metal particles are selected from the group consisting of gold, silver, ruthenium, rhodium; palladium, tin, iridium, osmium, platinum and mixtures thereof.