Preparation of super water repellent surface

1. A process for the preparation of a super water repellent surface comprising the steps of:

arranging a plurality of spherical beads on the surface of a substrate to form a (N)-th bead layer;

etching the substrate surface with the (N)-th bead layer as etching mask;

arranging a plurality of spherical beads, which are larger than the (N)-th beads in diameter, on the etched substrate surface to form a (N+1)-th bead layer;

etching the substrate surface with the (N+1)-th bead layer as etching mask;

removing the beads from the etched substrate surface; and

coating a fluorine compound on the substrate surface on which a hierarchical concavo-convex structure has been formed,

wherein the (N+1)-th bead layer forming step and the (N+1)-th etching step are repeated for N times.

2. The process for the preparation of a super water repellent surface as set forth in claim 1 ,

wherein the (N)-th bead layer is formed on the substrate surface by at least one method selected from spin coating, dip coating, lifting up, electrophoretic deposition, chemical or electrochemical deposition and electrospray, Langmuir-Blodgett(LB), and transfer the beads monolayer to substrate using printing.

3. The process for the preparation of a super water repellent surface as set forth in claim 1 ,

wherein the etching is performed by dry etching using an etching gas.

4. The process for the preparation of a super water repellent surface as set forth in claim 3 ,

wherein the substrate is selected from glass, quartz plate, silicon, plastic and polymer film.

5. The process for the preparation of a super water repellent surface as set forth in claim 3 ,

wherein the etching gas may be at least one selected from CF 4 , CHF 3 , C 2 F 6 , C 3 F 6 , C 3 F 8 , C 4 F 10 , HF, HBr, SF 6 , NF 3 , SiCl 4 , SiF 4 , BCl 3 , CCl 4 , CClF 3 , CCl 2 F 2 , C 2 ClF 5 and O 2 .

6. The process for the preparation of a super water repellent surface as set forth in claim 5 ,

wherein the etching gas is a mixture including H 2 .

7. The process for the preparation of a super water repellent surface as set forth in claim 1 ,

wherein the substrate surface on which the fluorine compound has been coated has at least one group selected from (CF 3 —), —(CF 2 —CF 2 ) n —, —(O(CF 2 ) m ) n —, —((CF 2 ) m O) n —, —(OC(CF 3 )FCF 2 ) n — and —(C(CF 3 )FCF 2 O) n —,

where 1≦m25 and 1≦n≦100.

8. The process for the preparation of a super water repellent surface as set forth in claim 7 ,

wherein the coating of the fluorine compound may be performed by at least one method selected from dip coating, spin coating, spray, self-assembled monolayer treatment of fluorosilane based compounds, surface polymerization by atom transfer radical polymerization of fluorine based monomers, grafting-from surface polymerization of fluorine based monomers, grafting-to surface polymerization of fluorine based compounds, surface polymerization of fluorine based compounds using plasma and surface modification of fluorine compounds using plasma.

9. The process for the preparation of a super water repellent surface as set forth in claim 8 ,

the process is performed continuously by the roll-to-roll method in one processing line.

10. The process for the preparation of a super water repellent surface as set forth in claim 6 ,

wherein N is a natural number 49 or smaller.

11. The process for the preparation of a super water repellent surface as set forth in claim 2 ,

wherein the etching is performed by dry etching using an etching gas.

12. The process for the preparation of a super water repellent surface as set forth in claim 2 ,

wherein the substrate surface on which the fluorine compound has been coated has at least one group selected from (CF 3 —), —(CF 2 —CF 2 ) n —, —(O(CF 2 ) m ) n —, —((CF 2 ) m O) n —, —(OC(CF 3 )FCF 2 ) n — and —(C(CF 3 )FCF 2 O) n —,

where 1≦m≦25 and 1≦n≦100.

13. The process for the preparation of a super water repellent surface as set forth in claim 8 ,

wherein N is a natural number 49 or smaller.