IP Library Granted Patent US 8,227,706
Granted Patent B2
US 8,227,706 · App. 12/347,600 · Granted Jul 24, 2012

Coaxial plated through holes (PTH) for robust electrical performance

Assignee: Intel Corporation
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Quick Facts
Patent No.
US 8,227,706
App. No.
12/347,600
Granted
Jul 24, 2012
Kind
B2
Abstract

In some embodiments, coaxial plated through holes (PTH) for robust electrical performance are presented. In this regard, an apparatus is introduced comprising an integrated circuit device and a substrate coupled with the integrated circuit device, wherein the substrate includes: a plated through hole, the plated through hole filled with dielectric material and a coaxial copper wire, and conductive traces to separately route the plated through hole and the coaxial copper wire. Other embodiments are also disclosed and claimed.

Claims (22)

1. An apparatus comprising:

an integrated circuit device; and

a substrate coupled with the integrated circuit device, wherein the substrate includes: a plated through hole, the plated through hole filled with dielectric material and a coaxial copper wire, wherein the coaxial copper wire comprises an inductor; conductive traces to separately route the plated through hole and the coaxial copper wire; and a plug in an end of the plated through hole, wherein the plug comprises magnetic material.

2. The apparatus of claim 1 , further comprising the conductive traces conductively coupled with differential pair contacts of the integrated circuit device.

3. The apparatus of claim 1 , further comprising the plated through hole conductively coupled with a ground contact of the integrated circuit device.

4. The apparatus of claim 1 , further comprising a second dielectric material filling the plated through hole.

5. The apparatus of claim 1 , further comprising the coaxial copper wire conductively coupled with a power contact of the integrated circuit device.

6. An electronic appliance comprising:

a network controller;

a system memory; and

a processor, wherein the processor comprises:

an integrated circuit device; and

a substrate coupled with the integrated circuit device, wherein the substrate includes

a plated through hole;

dielectric material filling the plated through hole;

a coaxial wire within the dielectric material, wherein the coaxial copper wire comprises an inductor;

conductive traces separately routing the plated through hole and the coaxial copper wire to contacts of the integrated circuit device; and

a plug in an end of the plated through hole, wherein the plug comprises magnetic material.

7. The electronic appliance of claim 6 , further comprising the conductive traces conductively coupled with differential pair contacts of the integrated circuit device.

8. The electronic appliance of claim 6 , further comprising the plated through hole conductively coupled with a ground contact of the integrated circuit device.

9. The electronic appliance of claim 6 , further comprising a second dielectric material filling the plated through hole.

10. The electronic appliance of claim 6 , further comprising the coaxial wire conductively coupled with a power contact of the integrated circuit device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2009
From: ROY, MIHIR; SURYAKUMAR, MAHADEVAN; LI, YONGGANG
To: INTEL CORPORATION
Reel/Frame 022548/0275 →
Continuity (1)
Related Publication 20100163295A1 · Jul 1, 2010