IP Library › Granted Patent US 8,269,218
Granted Patent B2
US 8,269,218 · App. 12/959,989 · Granted Sep 18, 2012

Display device

Assignee: Semiconductor Energy Laboratory Co., Ltd.
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Quick Facts
Patent No.
US 8,269,218
App. No.
12/959,989
Granted
Sep 18, 2012
Kind
B2
Abstract

One object is to provide a transistor including an oxide semiconductor film which is used for the pixel portion of a display device and has high reliability. A display device has a first gate electrode; a first gate insulating film over the first gate electrode; an oxide semiconductor film over the first gate insulating film; a source electrode and a drain electrode over the oxide semiconductor film; a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film; a second gate electrode over the second gate insulating film; an organic resin film having flatness over the second gate insulating film; a pixel electrode over the organic resin film having flatness, wherein the concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×10 16 cm −3 .

Claims (67)

1. A display device comprising:

a first gate electrode;

a first gate insulating film over the first gate electrode;

an oxide semiconductor film over the first gate insulating film;

a source electrode and a drain electrode over the oxide semiconductor film, wherein the source electrode and the drain electrode are electrically connected to the oxide semiconductor film;

a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film;

a second gate electrode over the second gate insulating film;

an organic resin film having flatness over the second gate insulating film;

a pixel electrode over the organic resin film having flatness, wherein the pixel electrode is electrically connected to either the source electrode or the drain electrode;

a first alignment film over and in contact with the second gate electrode and the pixel electrode;

a liquid crystal layer over the first alignment film;

a second alignment film over the liquid crystal layer;

a counter electrode over the second alignment film; and

a counter substrate over the counter electrode,

wherein a concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×10 16 cm −3 .

2. A display device comprising:

a first gate electrode;

a first gate insulating film over the first gate electrode;

an oxide semiconductor film over the first gate insulating film;

a source electrode and a drain electrode over the oxide semiconductor film, wherein the source electrode and the drain electrode are electrically connected to the oxide semiconductor film;

a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film;

a second gate electrode over the second gate insulating film;

an organic resin film having flatness over the second gate insulating film;

a pixel electrode over the organic resin film having flatness, wherein the pixel electrode is electrically connected to either the source electrode or the drain electrode;

an EL layer over the pixel electrode;

a counter electrode over the EL layer;

a sealing material over and in contact with the second gate electrode and the counter electrode; and

a counter substrate over the sealing material,

wherein a concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×10 16 cm −3 .

3. A display device comprising:

a first gate electrode;

a first gate insulating film over the first gate electrode;

an oxide semiconductor film over the first gate insulating film;

a source electrode and a drain electrode over the oxide semiconductor film, wherein the source electrode and the drain electrode are electrically connected to the oxide semiconductor film;

a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film;

a second gate electrode over the second gate insulating film;

an organic resin film having flatness over the second gate insulating film;

a pixel electrode over the organic resin film having flatness, wherein the pixel electrode is electrically connected to either the source electrode or the drain electrode; and

a filler over and in contact with the second gate electrode and the pixel electrode, wherein a spherical particle including a cavity is provided in the filler, the cavity contains a black region and a white region, and a space around the cavity is filled with a liquid,

wherein a concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×10 16 cm −3 .

4. A display device comprising:

a first gate electrode;

a first gate insulating film over the first gate electrode;

an oxide semiconductor film over the first gate insulating film;

a source electrode and a drain electrode over the oxide semiconductor film, wherein the source electrode and the drain electrode are electrically connected to the oxide semiconductor film;

a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film;

a second gate electrode over the second gate insulating film;

an organic resin film having flatness over the second gate insulating film;

a pixel electrode over the organic resin film having flatness, wherein the pixel electrode is electrically connected to either the source electrode or the drain electrode; and

an electronic ink layer over and in contact with the second gate electrode and the pixel electrode, wherein the electronic ink layer comprises a microcapsule in which positively charged white microparticles and negatively charged black microparticles are encapsulated,

wherein a concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×10 16 cm −3 .

5. A display device according to claim 1 , wherein the organic resin film does not overlap the second gate electrode.

6. A display device according to claim 2 , wherein the organic resin film does not overlap the second gate electrode.

7. A display device according to claim 3 , wherein the organic resin film does not overlap the second gate electrode.

8. A display device according to claim 4 , wherein the organic resin film does not overlap the second gate electrode.

9. A display device according to claim 1 , further comprising a passivation film over the second gate electrode and the second gate insulating film.

10. A display device according to claim 2 , further comprising a passivation film over the second gate electrode and the second gate insulating film.

11. A display device according to claim 3 , further comprising a passivation film over the second gate electrode and the second gate insulating film.

12. A display device according to claim 4 , further comprising a passivation film over the second gate electrode and the second gate insulating film.

13. A display device according to claim 1 , wherein a carrier density of the oxide semiconductor film is less than 1×10 12 cm −3 at 300 K.

14. A display device according to claim 2 , wherein a carrier density of the oxide semiconductor film is less than 1×10 12 cm −3 at 300 K.

15. A display device according to claim 3 , wherein a carrier density of the oxide semiconductor film is less than 1×10 12 cm −3 at 300 K.

16. A display device according to claim 4 , wherein a carrier density of the oxide semiconductor film is less than 1×10 12 cm −3 at 300 K.

17. A display device according to claim 1 , wherein the oxide semiconductor film comprises a material selected from the group consisting of In—Sn—Ga—Zn—O, In—Ga—Zn—O, In—Sn—Zn—O, In—Al—Zn—O, Sn—Ga—Zn—O, Al—Ga—Zn—O, Sn—Al—Zn—O, In—Zn—O, Sn—Zn—O, Al—Zn—O, Zn—Mg—O, Sn—Mg—O, In—Mg—O; In—O, Sn—O, and Zn—O.

18. A display device according to claim 2 , wherein the oxide semiconductor film comprises a material selected from the group consisting of In—Sn—Ga—Zn—O, In—Ga—Zn—O, In—Sn—Zn—O, In—Al—Zn—O, Sn—Ga—Zn—O, Al—Ga—Zn—O, Sn—Al—Zn—O, In—Zn—O, Sn—Zn—O, Al—Zn—O, Zn—Mg—O, Sn—Mg—O, In—Mg—O; In—O, Sn—O, and Zn—O.

19. A display device according to claim 3 , wherein the oxide semiconductor film comprises a material selected from the group consisting of In—Sn—Ga—Zn—O, In—Ga—Zn—O, In—Sn—Zn—O, In—Al—Zn—O, Sn—Ga—Zn—O, Al—Ga—Zn—O, Sn—Al—Zn—O, In—Zn—O, Sn—Zn—O, Al—Zn—O, Zn—Mg—O, Sn—Mg—O, In—Mg—O; In—O, Sn—O, and Zn—O.

20. A display device according to claim 4 , wherein the oxide semiconductor film comprises a material selected from the group consisting of In—Sn—Ga—Zn—O, In—Ga—Zn—O, In—Sn—Zn—O, In—Al—Zn—O, Sn—Ga—Zn—O, Al—Ga—Zn—O, Sn—Al—Zn—O, In—Zn—O, Sn—Zn—O, Al—Zn—O, Zn—Mg—O, Sn—Mg—O, In—Mg—O; In—O, Sn—O, and Zn—O.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2010
From: YAMAZAKI, SHUNPEI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 025543/0676 →
Priority Claims (1)
JP 2009-276454 · Dec 4, 2009 · national
Continuity (1)
Related Publication 20110133181A1 · Jun 9, 2011