IP Library › Granted Patent US 8,273,983
Granted Patent B2
US 8,273,983 · App. 12/244,939 · Granted Sep 25, 2012

Photonic device and method of making same using nanowires

Assignee: Hewlett-Packard Development Company, L.P.
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Quick Facts
Patent No.
US 8,273,983
App. No.
12/244,939
Filed
Oct 3, 2008
Granted
Sep 25, 2012
Kind
B2
Art Unit
1728
USPC
136/258
Abstract

A photonic device, a method of making the device and a nano-scale antireflector employ a bramble of nanowires. The photonic device and the method include a first layer of a microcrystalline material provided on a substrate surface and a second layer of a microcrystalline material provided on the substrate surface horizontally spaced from the first layer by a gap. The photonic device and the method further include, and the nano-scale antireflector includes, the bramble of nanowires formed between the first layer and the second layer. The nanowires have first ends integral to crystallites in each of the first layer and the second layer. The nanowires of the bramble extend into the gap from each of the first layer and the second layer.

Claims (28)

1. A photonic device comprising:

a first layer of a microcrystalline material on a substrate surface;

a second layer of a microcrystalline material on the substrate surface, the second layer being horizontally spaced from the first layer by a gap; and

a bramble of nanowires between the first layer and the second layer, the nanowires of the bramble having first ends integral to crystallites in each of the first layer and the second layer, the nanowires of the bramble extending into the gap from each of the first layer and the second layer.

2. The photonic device of claim 1 , wherein both the first layer and the second layer have respective horizontal surfaces and vertical surfaces relative to a horizontal plane of the substrate surface, the vertical surface of the first layer facing the vertical surface of the second layer, the vertical surfaces being spaced apart to delineate the gap, the first ends of the nanowires of the bramble being integral to crystallites of each the vertical surfaces and the horizontal surfaces.

3. The photonic device of claim 1 , further comprising separate electrical contacts to the first layer and the second layer, the bramble of nanowires being electrically accessible by the separate electrical contacts.

4. The photonic device of claim 1 , wherein the substrate comprises a material that insulates the first layer from the second layer, each of the first layer, the second layer and the bramble of nanowires independently comprising a semiconductor material.

5. The photonic device of claim 1 , wherein the bramble of nanowires comprises one or both of a heterojunction and a p-n junction.

6. The photonic device of claim 1 , further comprising a p-n junction located one or more of in the nanowires, between the nanowires, between the first layer and the nanowires, between the second layer and the nanowires, and between the first layer and the second layer.

7. The photonic device of claim 1 , further comprising a p-i-n junction between the first layer and the second layer, the bramble of nanowires being an intrinsic region of the p-i-n junction.

8. The photonic device of claim 1 , wherein the photonic device is one of a photodetector and a solar cell.

9. The photonic device of claim 1 , wherein the bramble of nanowires is a nano-scale antireflector, the nano-scale antireflector being light absorptive both in a wide band of frequencies and over a wide range of incident angles, such that negligible light is reflected from the gap.

10. The photonic device of claim 1 , wherein a nanowire extending into the gap from a vertical surface of the first layer is connected to a facing vertical surface of the second layer.

11. The photonic device of claim 1 , wherein a nanowire extending into the gap from the first layer is connected to a nanowire extending into the gap from the second layer.

12. A photonic device comprising: a first layer of a microcrystalline material on a substrate surface;

a second layer of a microcrystalline material on the substrate surface horizontally spaced from the first layer by a gap; and

a nano-scale antireflector in the gap between the first layer and the second layer, the nano-scale antireflector being light absorptive both in a wide band of optical frequencies and over a wide range of incident angles, such that negligible light is reflected from the gap;

wherein the nano-scale antireflector comprises a bramble of nanowires, the bramble comprising a plurality of randomly oriented nanowires having first ends integral to crystallites in each of the first layer and the second layer, the nanowires of the bramble extending into the gap from the first layer and the second layer.

13. The photonic device of claim 12 , wherein the first layer and the second layer have both vertical surfaces and horizontal surfaces, the vertical surface of the first layer facing the vertical surface of the second layer, the vertical surfaces being spaced apart to delineate the gap, the nanowires extending from crystallites of the vertical surfaces and horizontal surfaces of each of the first layer and the second layer, such that the bramble comprises the nanowires extending into the gap from opposing directions.

14. A method of making a photonic device comprising:

providing a first layer of a microcrystalline material on a substrate surface;

providing a second layer of a microcrystalline material on a substrate surface horizontally spaced from the first layer by a gap; and

forming a bramble of nanowires between the first layer and the second layer, the nanowires of the bramble having first ends integral to crystallites in each of the first layer and the second layer, such that the nanowires of the bramble extend into the gap from opposing directions.

15. The method of making of claim 14 , wherein the first layer and the second layer are provided with vertical surfaces and horizontal surfaces relative to the substrate surface, the vertical surface of the first layer facing the vertical surface of the second layer, the facing vertical surfaces being spaced apart to delineate the gap.

16. The method of making of claim 14 , wherein forming the bramble of nanowires comprises growing nanowires on vertical surfaces and horizontal surfaces of each of the first layer and the second layer, such that some of the nanowires on each of the first layer and the second layer extend into the gap.

17. The method of making of claim 14 , wherein forming the bramble of nanowires comprises growing nanowires from the first layer and the second layer to connect to one another in the gap.

18. The method of making of claim 14 , wherein forming the bramble of nanowires comprises growing a nanowire from a vertical surface of the first layer to connect to a facing vertical surface of the second layer, the facing vertical surfaces being spaced apart to delineate the gap.

19. The method of making of claim 14 , further comprising providing a p-n junction one or more of in the nanowires, between the nanowires, between the first layer and the nanowires, between the second layer and the nanowires, and between the first layer and the second layer.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 9, 2015
From: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
To: HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP
Reel/Frame 037079/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 2, 2009
From: WANG, SHIH-YUAN; WILLIAMS, R. STANLEY; KOBAYASHI, NOBUHIKO P.
To: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Reel/Frame 023169/0858 →
Continuity (2)
Provisional Application 61016425 · Dec 21, 2007
Related Publication 20110168256A1 · Jul 14, 2011