IP Library Granted Patent US 8,287,650
Granted Patent B2
US 8,287,650 · App. 12/207,695 · Granted Oct 16, 2012

Low sloped edge ring for plasma processing chamber

Assignee: Applied Materials, Inc.
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Quick Facts
Patent No.
US 8,287,650
App. No.
12/207,695
Granted
Oct 16, 2012
Kind
B2
Abstract

Embodiments of a cover ring for use in a plasma processing chamber are provided. In one embodiment, a cover ring for use in a plasma processing chamber includes a ring-shaped body fabricated from a yttrium (Y) containing material. The body includes a bottom surface having an inner locating ring and an outer locating ring. The inner locating ring extends further from the body than the outer locating ring. The body includes an inner diameter wall having a main wall and a secondary wall separated by a substantially horizontal land. The body also includes a top surface having an outer sloped top surface meeting an inner sloped surface at an apex. The inner sloped surface defines an angle with a line perpendicular to a centerline of the body less than about 70 degrees.

Claims (12)

1. A cover ring for use in a plasma processing chamber, comprising of:

a ring-shaped body fabricated from a yttrium (Y) containing material, the body comprising of:

a bottom surface having an inner locating ring and an outer locating ring, the inner locating ring extending further from the body than the outer locating ring, the inner locating ring having an inner wall, the inner wall facing a centerline of the ring-shaped body;

an inner diameter wall having a main wall and a secondary wall separated by a substantially horizontal land, the secondary wall having a diameter greater than the main wall and less than the inner wall of the inner locating ring; and

a top surface having a substantially horizontal inner top surface, an outer sloped surface, and an inner sloped surface, wherein the inner top surface is positioned outward of and above the substantially horizontal land and the outer sloped surface meets the inner sloped surface, the inner sloped surface defining an angle with a line perpendicular to a centerline of the body at less than about 70 degrees.

2. The cover ring of claim 1 , wherein the body is fabricated from bulk yttrium oxide (Y 2 O 3 ).

3. The cover ring of claim 1 , wherein the angle defined between the inner sloped surface and the line perpendicular to the centerline of the body is about 60 degrees.

4. The cover ring of claim 1 further comprising:

a notch in the bottom surface of the cover ring, the notch defined by the inner locating ring and the outer locating ring.

5. The cover ring of claim 1 , wherein the body is fabricated from a material selected from a group consisting of yttrium metal, yttrium alloy, and yttrium doped materials.

6. The cover ring of claim 1 , wherein the secondary wall and the substantially horizontal land define a substrate-receiving pocket.

7. The cover ring of claim 1 , wherein the bottom of the outer locating ring extends below the bottom of body less than the bottom of the inner locating ring.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 10, 2008
From: LEE, CHANGHUN; WILLWERTH, MICHAEL D.; NGUYEN, HOAN
To: APPLIED MATERIALS, INC.
Reel/Frame 021507/0576 →
Continuity (1)
Related Publication 20100059181A1 · Mar 11, 2010