Manufacturing method for semiconductor device
An improved manufacturing method for semiconductor devices is provided. This method can prevent chips and cracks from being generated when the rear face of the semiconductor substrate is polished. The manufacturing method includes preparing a semiconductor substrate having a front face and a rear face. The front face has an inner surface area and a peripheral surface area. Circuit elements are provided in the inner surface area of the semiconductor substrate. The manufacturing method also includes sealing the circuit elements with circuit sealing resin. The manufacturing method also includes providing cured resin in the peripheral surface area of the semiconductor substrate. The manufacturing method also includes polishing the rear face of the semiconductor substrate after the circuit sealing step. The manufacturing method also includes cutting the semiconductor substrate after the substrate polishing step so as to obtain semiconductor devices.
1. A manufacturing method for a semiconductor device, comprising:
a substrate preparation step of preparing a semiconductor substrate having a front face and a rear face, the front face having an inner surface area and a peripheral surface area, with circuit elements being provided in the inner surface area;
a circuit sealing step of sealing the circuit elements with circuit sealing resin such that the circuit sealing resin extends over the circuit elements;
a peripheral area resin formation step of providing cured resin in the peripheral surface area of the semiconductor substrate, said peripheral area resin formation step being carried out after said circuit sealing step;
a substrate polishing step of polishing the rear face of the semiconductor substrate after the circuit sealing step; and
a substrate cutting step of cutting the semiconductor substrate after the substrate polishing step so as to obtain at least one semiconductor device.
2. The manufacturing method for a semiconductor device according to claim 1 , wherein the peripheral area resin formation step comprises:
a substrate periphery enclosing step of enclosing a periphery of the semiconductor substrate after the circuit sealing step;
a resin injection step of injecting liquid resin into the peripheral surface area; and
a resin curing step of forming the cured resin by curing the injected liquid resin.
3. The manufacturing method for a semiconductor device according to claim 2 , wherein the resin injection step includes covering the surface of the circuit sealing resin with a resin injection mask in which a plurality of openings are created in a portion corresponding to the peripheral surface area, and injecting the liquid resin via the plurality of openings.
4. The manufacturing method for a semiconductor device according to claim 2 , wherein the resin injection step includes sequentially injecting the liquid resin into a plurality of locations in the peripheral surface area.
5. The manufacturing method for a semiconductor device according to claim 2 , wherein the resin injection step includes simultaneously injecting the liquid resin into a plurality of locations in the peripheral surface area.
6. The manufacturing method for a semiconductor device according to claim 1 , wherein the substrate polishing step includes polishing the rear face of the semiconductor substrate after attaching a protective tape on the surfaces of the circuit sealing resin and the cured resin.
7. The manufacturing method for a semiconductor device according to claim 1 , wherein the substrate polishing step includes polishing the rear face of the semiconductor substrate so that the thickness of the semiconductor substrate becomes 50 μm to 115 μm.
8. The manufacturing method for a semiconductor device according to claim 1 , wherein the circuit sealing resin and the cured resin are the same or similar type of resin.
9. The manufacturing method for a semiconductor device according to claim 2 , wherein the resin injection step includes injecting the liquid resin into a plurality of locations in the peripheral surface area in a predetermined order.
10. The manufacturing method for a semiconductor device according to claim 1 , wherein the thickness of the semiconductor substrate in the preparation step is about 700 μm.
11. The manufacturing method for a semiconductor device according to claim 1 , wherein the circuit sealing step provides the circuit sealing resin in the inner surface area only.
12. The manufacturing method for a semiconductor device according to claim 1 , wherein the height of the circuit sealing resin is about 200 μm.
13. The manufacturing method for a semiconductor device according to claim 2 , wherein the substrate periphery enclosing step is carried out with a periphery enclosing member, and the semiconductor substrate, the circuit sealing resin and the periphery enclosing member define in combination a recess to receive the liquid resin injected in the resin injection step.
14. The manufacturing method for a semiconductor device according to claim 2 , wherein the resin injection step is carried out with a squeegee.
15. The manufacturing method for a semiconductor device according to claim 1 , wherein the height of the circuit sealing resin is the same as the height of the cured resin.
16. A manufacturing method for a semiconductor device, comprising:
a substrate preparation step of preparing a semiconductor substrate having a front face and a rear face, the front face having an inner surface area and a peripheral surface area, with circuit elements being provided in the inner surface area;
providing conductive interconnects on the semiconductor substrate for connecting predetermined elements in the circuit elements with each other;
a circuit sealing step of sealing the circuit elements and the conductive interconnects with circuit sealing resin;
a peripheral area resin formation step of providing cured resin in the peripheral surface area of the semiconductor substrate, said peripheral area resin formation step being carried out after said circuit sealing step;
a substrate polishing step of polishing the rear face of the semiconductor substrate after the circuit sealing step; and
a substrate cutting step of cutting the semiconductor substrate after the substrate polishing step so as to obtain at least one semiconductor device.
17. The manufacturing method for a semiconductor device according to claim 16 , wherein the peripheral area resin formation step comprises:
a substrate periphery enclosing step of enclosing a periphery of the semiconductor substrate after the circuit sealing step;
a resin injection step of injecting liquid resin into the peripheral surface area; and
a resin curing step of forming the cured resin by curing the injected liquid resin.
18. The manufacturing method for a semiconductor device according to claim 17 , wherein the resin injection step includes covering the surface of the circuit sealing resin with a resin injection mask in which a plurality of openings are created in a portion corresponding to the peripheral surface area, and injecting the liquid resin via the plurality of openings.
19. The manufacturing method for a semiconductor device according to claim 17 , wherein the resin injection step includes sequentially injecting the liquid resin into a plurality of locations in the peripheral surface area.
20. The manufacturing method for a semiconductor device according to claim 17 , wherein the resin injection step includes simultaneously injecting the liquid resin into a plurality of locations in the peripheral surface area.