IP Library › Granted Patent US 8,309,383
Granted Patent B2
US 8,309,383 · App. 13/079,280 · Granted Nov 13, 2012

Solid-state imaging device and camera

Assignee: Sony Corporation
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Quick Facts
Patent No.
US 8,309,383
App. No.
13/079,280
Granted
Nov 13, 2012
Kind
B2
Abstract

A camera with a solid-state imaging device which includes a plurality of pixels in an arrangement, each of the pixels including a photoelectric conversion element, pixel transistors including a transfer transistor, and a floating diffusion region, in which the channel width of transfer gate of the transfer transistor is formed to be larger on a side of the floating diffusion region than on a side of the photoelectric conversion element.

Claims (13)

1. A camera, comprising:

a solid-state imaging device;

an optical system configured to lead incident light to a photoelectric conversion element included in the solid-state imaging device; and

a signal processing circuit configured to process signals output from the solid-state imaging device;

wherein,

the solid-state imaging device includes a plurality of pixels in an arrangement, each of the pixels including a photoelectric conversion element, pixel transistors including at least a transfer transistor and a floating diffusion region,

a channel width of a transfer gate of the transfer transistor is larger on a side of the floating diffusion region than on a side of the photoelectric conversion element,

the transfer gate is arranged on one of corner portions of the photoelectric conversion element and shaped with a convex periphery which faces and connects to the floating diffusion region and a linear periphery which faces and connects to the photoelectric conversion element,

a portion of the floating diffusion region in direct contact with the transfer gate is formed as a high impurity concentration region with an impurity concentration higher than that of a remainder of the floating diffusion region, and

other portions of the floating diffusion region around the high impurity concentration region and between the high impurity concentration region and a device isolation region is formed as a region having an impurity concentration lower than the high impurity concentration region.

2. The camera according to claim 1 , wherein the high impurity concentration region in the floating diffusion region is used as a contact region.

3. The camera according to claim 2 , wherein the pixel transistors other than the transfer transistor are shared in a set with a plurality of photoelectric conversion elements and a plurality of transfer transistors configured to readout signal charges output from the plurality of photoelectric conversion elements.

4. The camera according to claim 1 , wherein a plurality of the photoelectric conversion elements are provided and the floating diffusion region is shared with the plurality of photoelectric conversion elements.

Priority Claims (1)
JP 2007-311183 · Nov 30, 2007 · national
Continuity (3)
Division 12949210 · Nov 18, 2010
Continuation 12275489 · Nov 21, 2008
Related Publication 20110176041A1 · Jul 21, 2011